Presentation 2008-11-27
A Proposal of InGaN-Based Multiple-Colored Light Emitting Devices Using Selective Area Metal-Organic Vapor Phase Epitaxy
Tomonari SHIODA, Yuki TOMITA, Masakazu SUGIYAMA, Yukihiro SHIMOGAKI, Yoshiaki NAKANO,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Selective area metal-organic vapor phase epitaxy (SA-MOVPE) allows in-plane control of layer composition and thickness. We have analyzed thickness and photoluminescence (PL) profiles of InGaN layers around the relatively wide (>10μm) selective masks. Numerical simulation using vapor phase diffusion model was also carried out. To obtain deposition selectivity between masks and crystal surface, in-situ etching using hydrogen is effective because it prevents GaN nucleation on mask. Consequently, the maximum growth rate enhancement of 4.8 and photoluminescence peak shift of 54nm (nominal 11% indium composition shift) were achieved for InGaN bulk layer.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Metal-organic vapor phase epitaxy / selective area growth / InGaN / kinetic model / monolithic integration
Paper # ED2008-154,CPM2008-103,LQE2008-98
Date of Issue

Conference Information
Committee LQE
Conference Date 2008/11/20(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A Proposal of InGaN-Based Multiple-Colored Light Emitting Devices Using Selective Area Metal-Organic Vapor Phase Epitaxy
Sub Title (in English)
Keyword(1) Metal-organic vapor phase epitaxy
Keyword(2) selective area growth
Keyword(3) InGaN
Keyword(4) kinetic model
Keyword(5) monolithic integration
1st Author's Name Tomonari SHIODA
1st Author's Affiliation Research Center for Advanced Science and Technology, The University of Tokyo:School of Engineering, The University of Tokyo()
2nd Author's Name Yuki TOMITA
2nd Author's Affiliation School of Engineering, The University of Tokyo
3rd Author's Name Masakazu SUGIYAMA
3rd Author's Affiliation School of Engineering, The University of Tokyo
4th Author's Name Yukihiro SHIMOGAKI
4th Author's Affiliation School of Engineering, The University of Tokyo
5th Author's Name Yoshiaki NAKANO
5th Author's Affiliation Research Center for Advanced Science and Technology, The University of Tokyo:School of Engineering, The University of Tokyo
Date 2008-11-27
Paper # ED2008-154,CPM2008-103,LQE2008-98
Volume (vol) vol.108
Number (no) 323
Page pp.pp.-
#Pages 4
Date of Issue