| Presentation | 2009-01-29 Fabrication of Blazed Grating by Using Phase-Shifting Mask Hideyuki AWAZU, Kenji KINTAKA, Kenzo NISHIO, Yasuhiro AWATSUJI, Shogo URA, Junji NISHII, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A new simple interference exposure method using a phase-shifting mask was discussed on the basis of Fourier synthesis for fabricating blazed gratings. The phase-shifting mask consists of a periodic relief pattern and provides a required phase shift. The phase shifting was designed with 244nm exposure-light wavelength to launch multiple diffraction beams so that the resultant interference pattern formed a 3-μm-period sawtooth optical-intensity profile. An electron-beam resist was coated on a SiO_2 substrate. A relief of 65nm height was patterned on the SiO_2 substrate by electron-beam direct writing lithography. A plane wave was illuminated from the rear side of the phase-shifting mask and a sawtooth-like optical intensity profile was observed after 15μm propagation. A UV-photoresist layer coated on a substrate was exposed by the sawtooth-like intensity pattern and developed. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Phase-Shifting Mask / Blazed Gratings / Microfabrication Technique / Diffraction Optical Element / Interference Exposure / Near-Field Photolithography |
| Paper # | PN2008-42,OPE2008-145,LQE2008-142 |
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| Conference Information | |
| Committee | LQE |
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| Conference Date | 2009/1/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Lasers and Quantum Electronics (LQE) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of Blazed Grating by Using Phase-Shifting Mask |
| Sub Title (in English) | |
| Keyword(1) | Phase-Shifting Mask |
| Keyword(2) | Blazed Gratings |
| Keyword(3) | Microfabrication Technique |
| Keyword(4) | Diffraction Optical Element |
| Keyword(5) | Interference Exposure |
| Keyword(6) | Near-Field Photolithography |
| 1st Author's Name | Hideyuki AWAZU |
| 1st Author's Affiliation | Kyoto Institute of Technology() |
| 2nd Author's Name | Kenji KINTAKA |
| 2nd Author's Affiliation | National Institute of Advanced Industrial Science and Technology |
| 3rd Author's Name | Kenzo NISHIO |
| 3rd Author's Affiliation | Kyoto Institute of Technology |
| 4th Author's Name | Yasuhiro AWATSUJI |
| 4th Author's Affiliation | Kyoto Institute of Technology |
| 5th Author's Name | Shogo URA |
| 5th Author's Affiliation | Kyoto Institute of Technology |
| 6th Author's Name | Junji NISHII |
| 6th Author's Affiliation | National Institute of Advanced Industrial Science and Technology |
| Date | 2009-01-29 |
| Paper # | PN2008-42,OPE2008-145,LQE2008-142 |
| Volume (vol) | vol.108 |
| Number (no) | 419 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |