| Presentation | 2009/1/22 Preparation of Impurity-Doped ZnO Transparent Electrodes Suitable for LCD Applications by Magnetron Sputtering Junichi NOMOTO, Manabu KONAGAI, Haruki FUKADA, Toshihiro MIYATA, Tadatsugu MINAMI, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Impurity-doped ZnO thin films suitable for transparent electrode applications in LCDs that reduce resistivity and improve the uniformity of resistivity distribution have been prepared by newly developed oxidization-suppressing dc magnetron sputtering deposition methods that superimpose rf power and use more optimized targets. Descriptions are also presented concerning the observed increase in the resistivity of impurity-doped ZnO thin films resulting from exposure to long-term testing in a high humidity environment (air at 90% relative humidity and 60℃) as well as the increase in resistivity associated with a decrease of film thickness. The resistivity stability of impurity-doped ZnO thin films might be considerably improved by co-doping with another impurity. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Zinc oxide / transparent electrode / thin film / AZO / GZO / dc magnetron sputtering / resistivity |
| Paper # | EID2008-66 |
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| Conference Information | |
| Committee | EID |
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| Conference Date | 2009/1/22(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electronic Information Displays (EID) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Preparation of Impurity-Doped ZnO Transparent Electrodes Suitable for LCD Applications by Magnetron Sputtering |
| Sub Title (in English) | |
| Keyword(1) | Zinc oxide |
| Keyword(2) | transparent electrode |
| Keyword(3) | thin film |
| Keyword(4) | AZO |
| Keyword(5) | GZO |
| Keyword(6) | dc magnetron sputtering |
| Keyword(7) | resistivity |
| 1st Author's Name | Junichi NOMOTO |
| 1st Author's Affiliation | Optoelectronic Device System R&D Center, Kanazawa Institute of Technology() |
| 2nd Author's Name | Manabu KONAGAI |
| 2nd Author's Affiliation | Optoelectronic Device System R&D Center, Kanazawa Institute of Technology |
| 3rd Author's Name | Haruki FUKADA |
| 3rd Author's Affiliation | Optoelectronic Device System R&D Center, Kanazawa Institute of Technology |
| 4th Author's Name | Toshihiro MIYATA |
| 4th Author's Affiliation | Optoelectronic Device System R&D Center, Kanazawa Institute of Technology |
| 5th Author's Name | Tadatsugu MINAMI |
| 5th Author's Affiliation | Optoelectronic Device System R&D Center, Kanazawa Institute of Technology |
| Date | 2009/1/22 |
| Paper # | EID2008-66 |
| Volume (vol) | vol.108 |
| Number (no) | 421 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |