Presentation 2009/1/22
Emission Properties of Nanocrystalline Silicon based Metal-oxide-semiconductor Cathode Arrays
Yo KIDA, Hidetaka SHIMAWAKI, Yoichiro NEO, Hidenori MIMURA, Katsuhisa MURAKAMI, Fujio WAKAYA, Mikio TAKAI,
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Abstract(in English) Metal-oxide-semiconductor(MOS) cathode arrays based on nanocrystalline silicon covered with a thin oxide film prepared by a pulsed laser ablation technique have been fabricated and their emission properties have been investigated. The electron emission occurred at the gate voltage higher than the work function of the Au gate, and was relatively stable. We observed the emission image on the phosphor screen and the emission divergence was estimated to be less than 3°.
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Keyword(in English) MOS / tunneling cathode / electron emission / nanocrystalline silicon
Paper # EID2008-64
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Committee EID
Conference Date 2009/1/22(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Emission Properties of Nanocrystalline Silicon based Metal-oxide-semiconductor Cathode Arrays
Sub Title (in English)
Keyword(1) MOS
Keyword(2) tunneling cathode
Keyword(3) electron emission
Keyword(4) nanocrystalline silicon
1st Author's Name Yo KIDA
1st Author's Affiliation Graduate School of Engineering, Hachinohe Institute of Technology()
2nd Author's Name Hidetaka SHIMAWAKI
2nd Author's Affiliation Graduate School of Engineering, Hachinohe Institute of Technology
3rd Author's Name Yoichiro NEO
3rd Author's Affiliation Research Institute of Electronics, Shizuoka University
4th Author's Name Hidenori MIMURA
4th Author's Affiliation Research Institute of Electronics, Shizuoka University
5th Author's Name Katsuhisa MURAKAMI
5th Author's Affiliation Center for Quantum Science and Technology under Extreme Conditions, Osaka University
6th Author's Name Fujio WAKAYA
6th Author's Affiliation Center for Quantum Science and Technology under Extreme Conditions, Osaka University
7th Author's Name Mikio TAKAI
7th Author's Affiliation Center for Quantum Science and Technology under Extreme Conditions, Osaka University
Date 2009/1/22
Paper # EID2008-64
Volume (vol) vol.108
Number (no) 421
Page pp.pp.-
#Pages 4
Date of Issue