Presentation | 2009-01-15 Low Loss Coplanar Waveguide Structure on High-Resistivity Silicon Substrate Takehiko MAKITA, Isao TAMAI, Shinichi HOSHI, Shohei SEKI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We have fabricated and evaluated attenuation characteristics of coplanar waveguide (CPW) on high-resisitivity silicon substrate in order to realize low loss CPW whose attenuation constant is as low as that on semi-insulating compound semiconductor for microwave and millimeter wave band. When an insulated SiN layer was inserted between the CPW and high-resistivity silicon substrate, it was found that the attenuation constant exceeded 1dB/mm at 1GHz. The larger attenuation can be explained well by assuming a low resistivity layer between silicon substrate and insulated layer according to the equivalent circuit of the CPW. The CPW on high-resistivity silicon substrate with attenuation constant of less than 1dB/mm could be obtained by etching the insulated layer between the center strip and both side ground planes, which is comparable with that of CPW formed on the semi-insulating compound semiconductor substrate. This CPW structure enables high-resistivity silicon substrate to be adapted for multichip module technology. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Coplanar Waveguide / High-Resistivity Silicon Substrate / Low Loss |
Paper # | ED2008-209,MW2008-174 |
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Conference Information | |
Committee | MW |
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Conference Date | 2009/1/7(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Microwaves (MW) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Low Loss Coplanar Waveguide Structure on High-Resistivity Silicon Substrate |
Sub Title (in English) | |
Keyword(1) | Coplanar Waveguide |
Keyword(2) | High-Resistivity Silicon Substrate |
Keyword(3) | Low Loss |
1st Author's Name | Takehiko MAKITA |
1st Author's Affiliation | Corporate Research & Development Center, Oki Electric Industry Co., Ltd.() |
2nd Author's Name | Isao TAMAI |
2nd Author's Affiliation | Corporate Research & Development Center, Oki Electric Industry Co., Ltd. |
3rd Author's Name | Shinichi HOSHI |
3rd Author's Affiliation | Corporate Research & Development Center, Oki Electric Industry Co., Ltd. |
4th Author's Name | Shohei SEKI |
4th Author's Affiliation | Corporate Research & Development Center, Oki Electric Industry Co., Ltd. |
Date | 2009-01-15 |
Paper # | ED2008-209,MW2008-174 |
Volume (vol) | vol.108 |
Number (no) | 377 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |