Presentation 2008-12-05
Improved Performance of an SiC MOSFET by a Three-Dimensional Gate Structure
Yuichiro NANEN, Hironori YOSHIOKA, Masato NOBORIO, Jun SUDA, Tsunenobu KIMOTO,
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Abstract(in English) 4H-SiC (0001) MOSFETs with a three-dimensional gate structure, which has side-wall channels on the {112^^-0} face have been fabricated. Drain current is expected to increase due to geometrical effects of the three-dimensional gate structure and high channel mobility on the {112^^-0} face. The fabricated MOSFETs have exhibited superior characteristics: the subthreshold swing and V_ are, 210mV/decade and 3.8V, respectively. The drain current normalized by the gate width is increasing with decreasing the gate width. The normalized drain current of a 1μm-wide MOSFET is twenty times higher than that of a conventional planar MOSFET.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) silicon carbide (SiC) / MOSFET / three-dimensional gate structure
Paper # SDM2008-191
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Conference Information
Committee SDM
Conference Date 2008/11/28(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Improved Performance of an SiC MOSFET by a Three-Dimensional Gate Structure
Sub Title (in English)
Keyword(1) silicon carbide (SiC)
Keyword(2) MOSFET
Keyword(3) three-dimensional gate structure
1st Author's Name Yuichiro NANEN
1st Author's Affiliation Department of Electronic Science and Engineering, Kyoto University()
2nd Author's Name Hironori YOSHIOKA
2nd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
3rd Author's Name Masato NOBORIO
3rd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
4th Author's Name Jun SUDA
4th Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
5th Author's Name Tsunenobu KIMOTO
5th Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
Date 2008-12-05
Paper # SDM2008-191
Volume (vol) vol.108
Number (no) 335
Page pp.pp.-
#Pages 5
Date of Issue