Presentation | 2008-11-28 Flat Surface and High Electron Mobility of InAlN/AlGaN/AlN/GaN Heterostructures Masanobu HIROKI, Narihiko MAEDA, Takashi KOBAYASHI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We fabricated In_xAl_<1-x>N/Al_<0.38>Ga_<0.62>N/AlN/GaN hetero-structures with flat surfaces and high electron mobility. The density of the two-dimensional electron gas varies over a wide range and decreases from 2.3x10^<13> to 9x10^<12>cm^<-2>. The electron mobility is higher than that of conventional InAlN/AlN/GaN in the range of In content in InAlN from 0.13 to 0.31. The mobility increases from 1050 to 1960cm^2/V・s with increasing In content. A high transconductance of 230mS/mm and a large drain current of 1.2A/mm are obtained in field effect transistors made from both structures. For the new structure, the subthreshold swing is lowered 1.5 to 0.6V/dec. and the dark current is reduced 10^<-2> to 10^<-3>A/mm. The smoother surface of the new structure improves these parameters. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | GaN / AlGaN / InAlN / HEMT / HFET |
Paper # | ED2008-180,CPM2008-129,LQE2008-124 |
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Conference Information | |
Committee | ED |
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Conference Date | 2008/11/20(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Flat Surface and High Electron Mobility of InAlN/AlGaN/AlN/GaN Heterostructures |
Sub Title (in English) | |
Keyword(1) | GaN |
Keyword(2) | AlGaN |
Keyword(3) | InAlN |
Keyword(4) | HEMT |
Keyword(5) | HFET |
1st Author's Name | Masanobu HIROKI |
1st Author's Affiliation | NTT Photonics. Laboratories, NTT Corporation() |
2nd Author's Name | Narihiko MAEDA |
2nd Author's Affiliation | NTT Photonics. Laboratories, NTT Corporation |
3rd Author's Name | Takashi KOBAYASHI |
3rd Author's Affiliation | NTT Photonics. Laboratories, NTT Corporation:(Present office)NTT Advanced Technology Corporation |
Date | 2008-11-28 |
Paper # | ED2008-180,CPM2008-129,LQE2008-124 |
Volume (vol) | vol.108 |
Number (no) | 321 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |