Presentation 2008-11-28
Flat Surface and High Electron Mobility of InAlN/AlGaN/AlN/GaN Heterostructures
Masanobu HIROKI, Narihiko MAEDA, Takashi KOBAYASHI,
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Abstract(in English) We fabricated In_xAl_<1-x>N/Al_<0.38>Ga_<0.62>N/AlN/GaN hetero-structures with flat surfaces and high electron mobility. The density of the two-dimensional electron gas varies over a wide range and decreases from 2.3x10^<13> to 9x10^<12>cm^<-2>. The electron mobility is higher than that of conventional InAlN/AlN/GaN in the range of In content in InAlN from 0.13 to 0.31. The mobility increases from 1050 to 1960cm^2/V・s with increasing In content. A high transconductance of 230mS/mm and a large drain current of 1.2A/mm are obtained in field effect transistors made from both structures. For the new structure, the subthreshold swing is lowered 1.5 to 0.6V/dec. and the dark current is reduced 10^<-2> to 10^<-3>A/mm. The smoother surface of the new structure improves these parameters.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / AlGaN / InAlN / HEMT / HFET
Paper # ED2008-180,CPM2008-129,LQE2008-124
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Committee ED
Conference Date 2008/11/20(1days)
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Registration To Electron Devices (ED)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Flat Surface and High Electron Mobility of InAlN/AlGaN/AlN/GaN Heterostructures
Sub Title (in English)
Keyword(1) GaN
Keyword(2) AlGaN
Keyword(3) InAlN
Keyword(4) HEMT
Keyword(5) HFET
1st Author's Name Masanobu HIROKI
1st Author's Affiliation NTT Photonics. Laboratories, NTT Corporation()
2nd Author's Name Narihiko MAEDA
2nd Author's Affiliation NTT Photonics. Laboratories, NTT Corporation
3rd Author's Name Takashi KOBAYASHI
3rd Author's Affiliation NTT Photonics. Laboratories, NTT Corporation:(Present office)NTT Advanced Technology Corporation
Date 2008-11-28
Paper # ED2008-180,CPM2008-129,LQE2008-124
Volume (vol) vol.108
Number (no) 321
Page pp.pp.-
#Pages 4
Date of Issue