Presentation 2008-11-28
Study on AlGaN/GaN HEMTs on Si(111) substrates with thick AlGaN/GaN, GaN/AlN and AlGaN/GaN multilayers
Takaaki SUZUE, Masanori SUZUKI, Yukiyasu NOMURA, Takashi EGAWA,
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Abstract(in English) The study of AlGaN/GaN HEMTs by growing thick GaN on Si substrate was demonstrated using multilayer structure. The various multilayers grown were namely AlGaN/GaN, GaN/AlN and AlGaN/AlN and the bowing parameters of the AlGaN/GaN grown were studied. The bowing parameters were found to decrease as we move from pairs of AlGaN/GaN, GaN/AlN and AlGaN/AlN with increased Al concentration. This is due to the compression strain that originated from the difference in the lattice constant between GaN and the multilayer structure. By using the AlGaN/AlN multilayer structure, a total film thickness as high as 6μm was achieved without cracks.
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Keyword(in English) Si substrate / GaN / AlGaN/GaN / MOCVD / HEMT
Paper # ED2008-179,CPM2008-128,LQE2008-123
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Committee ED
Conference Date 2008/11/20(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Study on AlGaN/GaN HEMTs on Si(111) substrates with thick AlGaN/GaN, GaN/AlN and AlGaN/GaN multilayers
Sub Title (in English)
Keyword(1) Si substrate
Keyword(2) GaN
Keyword(3) AlGaN/GaN
Keyword(4) MOCVD
Keyword(5) HEMT
1st Author's Name Takaaki SUZUE
1st Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology()
2nd Author's Name Masanori SUZUKI
2nd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
3rd Author's Name Yukiyasu NOMURA
3rd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
4th Author's Name Takashi EGAWA
4th Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
Date 2008-11-28
Paper # ED2008-179,CPM2008-128,LQE2008-123
Volume (vol) vol.108
Number (no) 321
Page pp.pp.-
#Pages 4
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