| Presentation | 2008-10-31 Examination of Ar ion bombardment effect to ITO Thin Films Saki TAKAHASHI, Masato NIKI, Youhei NAKAMURA, Hidehiko SHIMIZU, Haruo IWANO, Yasuo FUKUSHIMA, Koutarou NAGATA, Yoichi HOSHI, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In order to examine deposition method to crystallize an ITO film at low temperature, deposition of ITO thin films was attempted by the combination of RF-DC coupled magnetron sputtering method and substrate bias sputtering method. As a result, when distance between target and substrate was short, the ITO film having the good crystallinity and low resestivity was not obtained. When distance between target and substrate was long, compared with short, the amount of Ar ion bombardment decreased. But tthe crystallinity of the film improved and the resestivity of the film decreased. This result is not a heated effect by the ion bombardment. It is thought that. Ar ions and particles of the film surface are caused by having changed a momentum and the oxygen of films is caused by it being done selective sputtering. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ITO thin film / RF-DC coupled magnetron sputtering method / substrate bias sputtering / low temperature |
| Paper # | CPM2008-84 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2008/10/23(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Examination of Ar ion bombardment effect to ITO Thin Films |
| Sub Title (in English) | |
| Keyword(1) | ITO thin film |
| Keyword(2) | RF-DC coupled magnetron sputtering method |
| Keyword(3) | substrate bias sputtering |
| Keyword(4) | low temperature |
| 1st Author's Name | Saki TAKAHASHI |
| 1st Author's Affiliation | Graduate School of Science and Technology, Niigata University() |
| 2nd Author's Name | Masato NIKI |
| 2nd Author's Affiliation | Graduate School of Science and Technology, Niigata University |
| 3rd Author's Name | Youhei NAKAMURA |
| 3rd Author's Affiliation | Faculty of Engineering, Niigata University |
| 4th Author's Name | Hidehiko SHIMIZU |
| 4th Author's Affiliation | Graduate School of Science and Technology, Niigata University |
| 5th Author's Name | Haruo IWANO |
| 5th Author's Affiliation | Graduate School of Science and Technology, Niigata University |
| 6th Author's Name | Yasuo FUKUSHIMA |
| 6th Author's Affiliation | Graduate School of Science and Technology, Niigata University |
| 7th Author's Name | Koutarou NAGATA |
| 7th Author's Affiliation | Graduate School of Science and Technology, Niigata University |
| 8th Author's Name | Yoichi HOSHI |
| 8th Author's Affiliation | Faculty of Engineering, Tokyo Polytechinic University |
| Date | 2008-10-31 |
| Paper # | CPM2008-84 |
| Volume (vol) | vol.108 |
| Number (no) | 269 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |