Presentation 2008-08-28
K-band AlGaN/GaN-based MMICs on Sapphire Substrates
Tomohiro MURATA, Masayuki KURODA, Shuichi NAGAI, Masaaki NISHIJIMA, Hidetoshi ISHIDA, Manabu YANAGIHARA, Tetsuzo UEDA, Hiroyuki SAKAI, Tsuyoshi TANAKA, Ming LI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We present K-band AlGaN/GaN HFET MMIC amplifiers with integrated microstrip lines on sapphire substrates. The microstrip lines with via-holes through chemically stable sapphire are successfully formed by using a novel laser drilling technique. Integrated AlGaN/GaN MIS-HFETs have in-situ SiN as a gate insulator, which is formed subsequently after the epitaxial growth without any exposure in the air. A typical MIS-HFET shows f_ of 203GHz. The compact 3-stage amplifier exhibits a small-signal gain as high as 22dB at 26GHz with a 3dB bandwidth of 4GHz. The presented K-band MMIC would be applicable to future millimeter-wave communication systems.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) AlGaN/GaN heterojunction FET / MMIC amplifiers / sapphire / via hole / laser drilling / microstrip line
Paper # MW2008-85
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Committee MW
Conference Date 2008/8/21(1days)
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Registration To Microwaves (MW)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) K-band AlGaN/GaN-based MMICs on Sapphire Substrates
Sub Title (in English)
Keyword(1) AlGaN/GaN heterojunction FET
Keyword(2) MMIC amplifiers
Keyword(3) sapphire
Keyword(4) via hole
Keyword(5) laser drilling
Keyword(6) microstrip line
1st Author's Name Tomohiro MURATA
1st Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.()
2nd Author's Name Masayuki KURODA
2nd Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
3rd Author's Name Shuichi NAGAI
3rd Author's Affiliation Panasonic Boston Laboratory, Panasonic Technologies Company
4th Author's Name Masaaki NISHIJIMA
4th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
5th Author's Name Hidetoshi ISHIDA
5th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
6th Author's Name Manabu YANAGIHARA
6th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
7th Author's Name Tetsuzo UEDA
7th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
8th Author's Name Hiroyuki SAKAI
8th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
9th Author's Name Tsuyoshi TANAKA
9th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
10th Author's Name Ming LI
10th Author's Affiliation Panasonic Boston Laboratory, Panasonic Technologies Company
Date 2008-08-28
Paper # MW2008-85
Volume (vol) vol.108
Number (no) 195
Page pp.pp.-
#Pages 4
Date of Issue