講演名 | 2008-07-09 AlGaN/GaN-based Electron Devices with Low-temperature GaN Cap Layer(Session1: Compound Semiconductor Devices) , |
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抄録(和) | |
抄録(英) | We review our studies on AlGaN/GaN-based electron devices with a low-temperature GaN (LT-GaN) cap layer, such as heterostructure field-effect transistors (HFETs) and Schottky barrier diodes (SBDs). Novel HFETs with a LT-GaN cap layer have been proposed and fabricated, and we found that by using this LT-GaN cap layer as a gate insulator and providing surface passivation helps to significantly suppress current collapse and gate leakage in AlGaN/GaN HFETs. Furthermore, the combination of a LT-GaN cap layer and SiN film for the surface passivation led to both the suppression of current collapse and no significant degradation in the gate-drain breakdown voltage. We also investigated the correlation between the crystalline quality of LT-GaN cap layers and the current collapse in AlGaN/GaN HFETs, and found that a polycrystalline structure provides the most effective LT-GaN cap layer for suppressing current collapse. AlGaN/GaN SBDs using a LT-GaN cap layer to provide edge termination were also fabricated on Si substrates. The collapse-free AlGaN/GaN SBDs exhibited a high breakdown voltage of 1530V. |
キーワード(和) | |
キーワード(英) | AlGaN/GaN / low-temperature GaN / SBD / HFET / contact resistance / current collapse / leakage current / breakdown voltage / enhancement-mode |
資料番号 | ED2008-41,SDM2008-60 |
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研究会情報 | |
研究会 | ED |
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開催期間 | 2008/7/2(から1日開催) |
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講演論文情報詳細 | |
申込み研究会 | Electron Devices (ED) |
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本文の言語 | ENG |
タイトル(和) | |
サブタイトル(和) | |
タイトル(英) | AlGaN/GaN-based Electron Devices with Low-temperature GaN Cap Layer(Session1: Compound Semiconductor Devices) |
サブタイトル(和) | |
キーワード(1)(和/英) | / AlGaN/GaN |
第 1 著者 氏名(和/英) | / Tadayoshi Deguchi |
第 1 著者 所属(和/英) | Advanced Technology Center, Research Laboratory, New Japan Radio Co., Ltd. |
発表年月日 | 2008-07-09 |
資料番号 | ED2008-41,SDM2008-60 |
巻番号(vol) | vol.108 |
号番号(no) | 121 |
ページ範囲 | pp.- |
ページ数 | 6 |
発行日 |