Presentation 2008-07-18
Problems and Prospect of 3D Integration using Wireless and Optical Interconnection Technologies
Atsushi IWATA, Shin YOKOYAMA,
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Abstract(in English) In 3-D integration technology which aims to enhance integration scale and performance, chip-to-chip interconnection is the most important issue. At present, 3-D integration using trough Si via (TSV) are intensively developed targeting a large capacity memory. However, problems in testing and heat spread are not resolved. For 20 years, 3-D integration using optical interconnect has been studied. Recently, inductor coupling, capacitor coupling and antenna coupling have been studied to realize higher data rate with lower power dissipation comparing with the TSV method. If system is designed with sufficient noise margin, reliability of wireless interconnections does not degrade comparing with vias. In the future, these interconnections are combined and introduced to 3-D integration utilizing each features.
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Keyword(in English) trough silicon via (TSV) / optical interconnection / inductor coupling / capacitor coupling / radio wave coupling
Paper # SDM2008-143,ICD2008-53
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Committee ICD
Conference Date 2008/7/10(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Problems and Prospect of 3D Integration using Wireless and Optical Interconnection Technologies
Sub Title (in English)
Keyword(1) trough silicon via (TSV)
Keyword(2) optical interconnection
Keyword(3) inductor coupling
Keyword(4) capacitor coupling
Keyword(5) radio wave coupling
1st Author's Name Atsushi IWATA
1st Author's Affiliation Graduate School of Advanced Sciences of Matter, Hiroshima University()
2nd Author's Name Shin YOKOYAMA
2nd Author's Affiliation Research Institute for Nanodevice and Bio Systems, Hiroshima University
Date 2008-07-18
Paper # SDM2008-143,ICD2008-53
Volume (vol) vol.108
Number (no) 140
Page pp.pp.-
#Pages 6
Date of Issue