| Presentation | 2008-07-24 Fabrication of Bi-2212/MgO thin-films by the Metal-Organic Decomposition (MOD) method Shoji Watanabe, Koji Hamanaka, Takashi Tachiki, Takashi Uchida, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have been fabricating a Bi_2Sr_2CaCu_2O_<8+x> (Bi-2212) thin film on an MgO substrate in order to apply the film to high frequency devices such as a terahertz oscillator and detector. In this study, Bi-2212/MgO thin films were fabricated by the metal-organic decomposition (MOD) method, which has the advantages such as its low running cost and ability to fabricate large-area films, and evaluated these films. The films were fabricated by a 2-step heat treatment consisting of precursor film fabrication and firing processes. The c-axis oriented Bi-2212 films were obtained and the Δω observed in a rocking curve was about 0.19 deg. In a measurement of in-plane-orientation, it was found that a rotation angle of 45 deg was dominant at the initial stage of the crystal growth and that the angle shifted to ±12 deg with enhancing the growth. From a current-voltage characteristic, J_c of 1.7×10^4A/cm^2 was obtained at 60K. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Metal-organic decomposition (MOD) method / Bi-2212 thin films / MgO substrate / X-ray diffraction (XRD) |
| Paper # | SCE2008-15 |
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| Conference Information | |
| Committee | SCE |
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| Conference Date | 2008/7/17(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Superconductive Electronics (SCE) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of Bi-2212/MgO thin-films by the Metal-Organic Decomposition (MOD) method |
| Sub Title (in English) | |
| Keyword(1) | Metal-organic decomposition (MOD) method |
| Keyword(2) | Bi-2212 thin films |
| Keyword(3) | MgO substrate |
| Keyword(4) | X-ray diffraction (XRD) |
| 1st Author's Name | Shoji Watanabe |
| 1st Author's Affiliation | Department of Electrical and Electronic Engineering, National Defense Academy() |
| 2nd Author's Name | Koji Hamanaka |
| 2nd Author's Affiliation | Department of Electrical and Electronic Engineering, National Defense Academy |
| 3rd Author's Name | Takashi Tachiki |
| 3rd Author's Affiliation | Department of Electrical and Electronic Engineering, National Defense Academy |
| 4th Author's Name | Takashi Uchida |
| 4th Author's Affiliation | Department of Electrical and Electronic Engineering, National Defense Academy |
| Date | 2008-07-24 |
| Paper # | SCE2008-15 |
| Volume (vol) | vol.108 |
| Number (no) | 152 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |