Presentation 2008-06-27
Electrically pumped GaInAsP/InP DFB Laser on SOI Substrate by Direct Wafer Bonding
Tadashi OKUMURA, Takeo MARUYAMA, Hidenori YONEZAWA, Nobuhiko NISHIYAMA, Shigehisa ARAI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) With aiming at realization of single wavelength lasers required for optical wiring in next generation LSIs, we investigated GaInAsP/InP DFB lasers prepared on an SOI substrate A continuous-wave operation up to 85℃ under optical pumping was demonstrated with GaInAsP/InP membrane DFB lasers prepared on an SOI substrate. Additionally, injection type DFB lasers directly bonded on an SOI substrate were successfully realized for the first time by reducing the series resistance. A threshold current as low as 104mA was obtained under a room-temperature pulsed condition for the stripe width of 25μm and the cavity length of 1mm.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Silicon on Insulator / Distributed Feedback laser / Wafer bonding / Membrane laser
Paper # OPE2008-28,LQE2008-29
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Committee LQE
Conference Date 2008/6/20(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electrically pumped GaInAsP/InP DFB Laser on SOI Substrate by Direct Wafer Bonding
Sub Title (in English)
Keyword(1) Silicon on Insulator
Keyword(2) Distributed Feedback laser
Keyword(3) Wafer bonding
Keyword(4) Membrane laser
1st Author's Name Tadashi OKUMURA
1st Author's Affiliation Quantum Nanoelectronics Research Center, Tokyo Institute of Technology:Department of Electrical and Electronic Engineering Tokyo Institute of Technology()
2nd Author's Name Takeo MARUYAMA
2nd Author's Affiliation Quantum Nanoelectronics Research Center Tokyo Institute of Technology:Japan Science and Technology Agency:Graduate School of Natural Science & Technology,Kanazawa University
3rd Author's Name Hidenori YONEZAWA
3rd Author's Affiliation Quantum Nanoelectronics Research Center, Tokyo Institute of Technology:Department of Electrical and Electronic Engineering Tokyo Institute of Technology
4th Author's Name Nobuhiko NISHIYAMA
4th Author's Affiliation Department of Electrical and Electronic Engineering Tokyo Institute of Technology
5th Author's Name Shigehisa ARAI
5th Author's Affiliation Quantum Nanoelectronics Research Center Tokyo Institute of Technology:Japan Science and Technology Agency
Date 2008-06-27
Paper # OPE2008-28,LQE2008-29
Volume (vol) vol.108
Number (no) 114
Page pp.pp.-
#Pages 6
Date of Issue