| Presentation | 2008-06-13 Particle Performance Improvement of Single-Wafer Wet Cleaning for Next Generation Ken-ichi SANO, Katsuhiko Miya, Akira Izumi, Jim Snow, Atsuro Eitoku, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | 3X-nm particles have been measured in recent years. This study focused on small particle removal and adhesion in a semiconductor wafer cleaning, countermeasures, as well as key major factors. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Single-wafer cleaning / Particle / Two-fluid spray |
| Paper # | ED2008-28 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2008/6/6(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Particle Performance Improvement of Single-Wafer Wet Cleaning for Next Generation |
| Sub Title (in English) | |
| Keyword(1) | Single-wafer cleaning |
| Keyword(2) | Particle |
| Keyword(3) | Two-fluid spray |
| 1st Author's Name | Ken-ichi SANO |
| 1st Author's Affiliation | Dainippon Screen MFG. Co., LTD.() |
| 2nd Author's Name | Katsuhiko Miya |
| 2nd Author's Affiliation | Dainippon Screen MFG. Co., LTD. |
| 3rd Author's Name | Akira Izumi |
| 3rd Author's Affiliation | Dainippon Screen MFG. Co., LTD. |
| 4th Author's Name | Jim Snow |
| 4th Author's Affiliation | Dainippon Screen MFG. Co., LTD. |
| 5th Author's Name | Atsuro Eitoku |
| 5th Author's Affiliation | Dainippon Screen MFG. Co., LTD. |
| Date | 2008-06-13 |
| Paper # | ED2008-28 |
| Volume (vol) | vol.108 |
| Number (no) | 87 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |