| Presentation | 2008/2/1 32nm node Ultralow-k(k=2.1)/Cu Damascene Multilevel Interconnect using High-Porosity (50%) High-Modulus (9GPa) Self-Assembled Porous Silica S. Chikaki, K. Kinoshita, T. Nakayama, K. Kohmura, H. Tanaka, M. Hirakawa, E. Soda, Y. Seino, N. Hata, T. Kikkawa, S. Saito, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Self-assembled / Low-k / Interconnect / Porous silica |
| Paper # | SDM2007-267 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 2008/2/1(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | 32nm node Ultralow-k(k=2.1)/Cu Damascene Multilevel Interconnect using High-Porosity (50%) High-Modulus (9GPa) Self-Assembled Porous Silica |
| Sub Title (in English) | |
| Keyword(1) | Self-assembled |
| Keyword(2) | Low-k |
| Keyword(3) | Interconnect |
| Keyword(4) | Porous silica |
| 1st Author's Name | S. Chikaki |
| 1st Author's Affiliation | Semiconductor Leading Edge Technologies, Inc. (Selete)() |
| 2nd Author's Name | K. Kinoshita |
| 2nd Author's Affiliation | Semiconductor Leading Edge Technologies, Inc. (Selete) |
| 3rd Author's Name | T. Nakayama |
| 3rd Author's Affiliation | ULVAC, Inc. |
| 4th Author's Name | K. Kohmura |
| 4th Author's Affiliation | Mitsui Chemicals, Inc. |
| 5th Author's Name | H. Tanaka |
| 5th Author's Affiliation | Mitsui Chemicals, Inc. |
| 6th Author's Name | M. Hirakawa |
| 6th Author's Affiliation | ULVAC, Inc. |
| 7th Author's Name | E. Soda |
| 7th Author's Affiliation | Semiconductor Leading Edge Technologies, Inc. (Selete) |
| 8th Author's Name | Y. Seino |
| 8th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 9th Author's Name | N. Hata |
| 9th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 10th Author's Name | T. Kikkawa |
| 10th Author's Affiliation | Hiroshima Univ.:National Institute of Advanced Industrial Science and Technology (AIST) |
| 11th Author's Name | S. Saito |
| 11th Author's Affiliation | Semiconductor Leading Edge Technologies, Inc. (Selete) |
| Date | 2008/2/1 |
| Paper # | SDM2007-267 |
| Volume (vol) | vol.107 |
| Number (no) | 481 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |