Presentation 2008-05-15
Preparation of TiO_2 films by RF magnetron sputtering method
Tatsuya ENDO, Yuichi MIZUCHI, Masaaki ISAI,
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Abstract(in English) TiO_2 films have been focused as a photocatalyst. They have remarkable properties, for example, to resolute organic pollutant and to give hydrophobicity by irradiating near-ultra-violet-light. In the conventional preparation processes, a heating process should be used to improve their crystallinity and films are easily peeled from substrates. This research is aimed to prepare TiO_2 films on slide-glass substrates at room temperature by using magnetron sputtering method. TiO_2 powder was used as a target material. Ar gas was used as a sputtering atmosphere. Variations of crystal properties and morphology were investigated as a function of substrate temperature. It was found that Anatase-type films could be prepared at room temperature.
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Keyword(in English) TiO_2 thin film / RF magnetron sputtering / photocatalyst / low temperature preparation
Paper # ED2008-6,CPM2008-14,SDM2008-26
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Committee CPM
Conference Date 2008/5/8(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Preparation of TiO_2 films by RF magnetron sputtering method
Sub Title (in English)
Keyword(1) TiO_2 thin film
Keyword(2) RF magnetron sputtering
Keyword(3) photocatalyst
Keyword(4) low temperature preparation
1st Author's Name Tatsuya ENDO
1st Author's Affiliation Graduate School of Engineering, Shizuoka University()
2nd Author's Name Yuichi MIZUCHI
2nd Author's Affiliation Faculty of Engineering, Shizuoka University
3rd Author's Name Masaaki ISAI
3rd Author's Affiliation Graduate School of Engineering, Shizuoka University:Faculty of Engineering, Shizuoka University
Date 2008-05-15
Paper # ED2008-6,CPM2008-14,SDM2008-26
Volume (vol) vol.108
Number (no) 35
Page pp.pp.-
#Pages 6
Date of Issue