Presentation 2007-12-14
Effective Activation of Phosphorus atom in Si film using ELA
Takashi NOGUCHI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) After UV pulsed excimer laser annealing to highly phosphorus dosed Si film at a dose of 2E15cm2, the conductivity and the correlating crystallinity in the film were analyzed. The crystallinity deduced by S.E. (Spectroscopic Ellipsometry) and by Raman spectroscopy shows good correlation. The conductivity increased with improving the crystallinity. By performing an optimized laser annealing, efficient solidified activation after instantaneous melting occurs, extremely low sheet resistance value down to 100ohm/sq. was obtained for the annealed Si film. Clear tensile stress was observed similar to the case of ELC (Excimer Laser Crystallization) for un-doped Si film. ELA activation subsequently after ion doping is considered effective to the formation of source and drain in high-performance Si TFTs as well as a sensor diode for SoP (System on Panel).
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Keyword(in English) Poly-Si / TFT / Sheet resistance / Activation / Ion doping
Paper # SDM2007-227
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Conference Information
Committee SDM
Conference Date 2007/12/7(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Effective Activation of Phosphorus atom in Si film using ELA
Sub Title (in English)
Keyword(1) Poly-Si
Keyword(2) TFT
Keyword(3) Sheet resistance
Keyword(4) Activation
Keyword(5) Ion doping
1st Author's Name Takashi NOGUCHI
1st Author's Affiliation University of the Ryukyus, Faculty of Engineering()
Date 2007-12-14
Paper # SDM2007-227
Volume (vol) vol.107
Number (no) 388
Page pp.pp.-
#Pages 4
Date of Issue