Presentation 2007-10-12
Study on AlGaN/GaN HEMT structures on 4-inch Si(111) substrates with thick buffer layers
Yutaka TERADA, Takaaki SUZUE, Hiroyasu ISHIKAWA, Takashi EGAWA,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We investigated GaN/AlN multilayers for thick buffer of AlGaN/GaN HEMTs on Si. Epiwafer bowing increased with increasing the total epilayer thickness. But epiwafer bowing did not increase when the thickness of GaN was thin. In the investigation of temperature dependent Hall measurement, Hall mobilities increased with increasing the number of pairs in multilayers. It was due to decreasing of dislocation in the interface between GaN and multilayers. Since so many cracks observed in epiwafer with 100 pair multilayers, 70 pairs are suitable.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) 4-inch / Si substrate / GaN / AlGaN/GaN / MOCVD / HEMT
Paper # ED2007-168,CPM2007-94,LQE2007-69
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Committee LQE
Conference Date 2007/10/4(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Study on AlGaN/GaN HEMT structures on 4-inch Si(111) substrates with thick buffer layers
Sub Title (in English)
Keyword(1) 4-inch
Keyword(2) Si substrate
Keyword(3) GaN
Keyword(4) AlGaN/GaN
Keyword(5) MOCVD
Keyword(6) HEMT
1st Author's Name Yutaka TERADA
1st Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology()
2nd Author's Name Takaaki SUZUE
2nd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
3rd Author's Name Hiroyasu ISHIKAWA
3rd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
4th Author's Name Takashi EGAWA
4th Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
Date 2007-10-12
Paper # ED2007-168,CPM2007-94,LQE2007-69
Volume (vol) vol.107
Number (no) 253
Page pp.pp.-
#Pages 4
Date of Issue