Presentation 2007-10-12
Low leakage current ITO Schottky electrode for AlGaN/GaN HEMT
Keita MATSUDA, Takeshi KAWASAKI, Ken NAKATA, Takeshi IGARASHI, Seiji YAEGASSI,
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Abstract(in English) AlGaN/GaN HEMTs are attractive devices for high power switching applications because of their high electron mobility and high breakdown characteristics. However, conventional Ni/Au Schottky electrode has high reverse leakage current[1], which deteriorates reliability and increases power dissipation. Now we report that the reduction of Schottky leakage current and low leakage current HEMT characteristics were achieved by using indium-tin-oxide (ITO) electrode instead of Ni/Au electrode.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) ITO electrode / lower leakage current / Schottky characteristics / temperature dependence / HEMT characteristics / gate leakage current
Paper # ED2007-167,CPM2007-93,LQE2007-68
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Committee LQE
Conference Date 2007/10/4(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Low leakage current ITO Schottky electrode for AlGaN/GaN HEMT
Sub Title (in English)
Keyword(1) ITO electrode
Keyword(2) lower leakage current
Keyword(3) Schottky characteristics
Keyword(4) temperature dependence
Keyword(5) HEMT characteristics
Keyword(6) gate leakage current
1st Author's Name Keita MATSUDA
1st Author's Affiliation Eudyna Devices Inc.()
2nd Author's Name Takeshi KAWASAKI
2nd Author's Affiliation Eudyna Devices Inc.
3rd Author's Name Ken NAKATA
3rd Author's Affiliation Eudyna Devices Inc.
4th Author's Name Takeshi IGARASHI
4th Author's Affiliation Eudyna Devices Inc.
5th Author's Name Seiji YAEGASSI
5th Author's Affiliation Eudyna Devices Inc.
Date 2007-10-12
Paper # ED2007-167,CPM2007-93,LQE2007-68
Volume (vol) vol.107
Number (no) 253
Page pp.pp.-
#Pages 5
Date of Issue