Presentation 2007-10-12
Surface control of AlGaN/GaN structure and its application to transistors
M. Tajima, J. Kotani, T. Tamura, T. Hashizume,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have investigated the change in DC characteristics of AlGaN/GaN HEMTs after the gate-and drain-bias stress at high temperatures. A pronounced reduction of drain current and a degradation of transfer characteristics were observed after an off-state stress at 220℃. To improve the operation stability of the HEMT device, we have developed a surface control process utilizing an ultrathin Al layer. The process was very effective in reducing gate leakage currents. The device with the surface control process showed no degradation in DC characteristics even after the off-state stress at 220℃. It is likely that the surface process effectively suppress a trap- and/or defect-assisted multiplication of defect levels near AlGaN surface during the BT stress.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / AlGaN / HEMT / surface control / stability / reliability
Paper # ED2007-170,CPM2007-96,LQE2007-71
Date of Issue

Conference Information
Committee CPM
Conference Date 2007/10/4(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Surface control of AlGaN/GaN structure and its application to transistors
Sub Title (in English)
Keyword(1) GaN
Keyword(2) AlGaN
Keyword(3) HEMT
Keyword(4) surface control
Keyword(5) stability
Keyword(6) reliability
1st Author's Name M. Tajima
1st Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University()
2nd Author's Name J. Kotani
2nd Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
3rd Author's Name T. Tamura
3rd Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
4th Author's Name T. Hashizume
4th Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
Date 2007-10-12
Paper # ED2007-170,CPM2007-96,LQE2007-71
Volume (vol) vol.107
Number (no) 252
Page pp.pp.-
#Pages 4
Date of Issue