| Presentation | 2007/6/18 A New Patterning Technique on UV Sensitive Transparent Film with Chip Embedded Photomask Oktay Yarimaga, Tae Won Kim, Yun Kyung Jung, Maesoon Im, Bonsang Gu, Hyun Gyu Park, Yang-Kyu Choi, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A new pattering technique on a UV sensitive transparent film that can have important implications for sensor and transparent device applications is proposed. One of the patterning methods on UV sensitive transparent substrates involves UV front-side exposure with an extra photomask, an approach commonly employed in conventional lithographic processes. However, the use of an extra photomask requires an expensive and complicated lithographic process. Thus, this approach is not appropriate for commercial implementation to consumable low-cost device applications. In this paper, a new method involving back-side exposure is demonstrated with a chip embedded photomask. This approach inherently provides a self-alignment process. A SU-8 layer with thicknesses of 30μm and 100μm, respectively, and with designed pattern sizes in a range of 200μm to 700μm was used as a chip embedded photomask to transfer patterns on the front-side of a Polydiacetylene (PDA)-Polyvinyl alcohol (PVA) film substrate with UV light. The UV light was then exposed from the back-side of the chip. A Pyrex glass wafer of 800μm thickness was employed as a substrate, permitting back-side exposure. The designed SU-8 patterns on the Pyrex glass do not allow transmission of the UV light to the PDA-PVA film on the top region of the SU-8 patterns. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | UV sensitive polymers / Polydiacetylene / Pattern Generation / SU-8 Embedded Mask |
| Paper # | ED2007-126,SDM2007-131 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2007/6/18(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A New Patterning Technique on UV Sensitive Transparent Film with Chip Embedded Photomask |
| Sub Title (in English) | |
| Keyword(1) | UV sensitive polymers |
| Keyword(2) | Polydiacetylene |
| Keyword(3) | Pattern Generation |
| Keyword(4) | SU-8 Embedded Mask |
| 1st Author's Name | Oktay Yarimaga |
| 1st Author's Affiliation | Electrical Eng. Dept., NanoBioElectronic Lab., Korean Advanced Inst. of Science and Technology() |
| 2nd Author's Name | Tae Won Kim |
| 2nd Author's Affiliation | Chemical and Biomolecular Eng. Dept., Biochip & Biodevice Lab., Korean Advanced Inst. of Science and Technology |
| 3rd Author's Name | Yun Kyung Jung |
| 3rd Author's Affiliation | Chemical and Biomolecular Eng. Dept., Biochip & Biodevice Lab., Korean Advanced Inst. of Science and Technology |
| 4th Author's Name | Maesoon Im |
| 4th Author's Affiliation | Electrical Eng. Dept., NanoBioElectronic Lab., Korean Advanced Inst. of Science and Technology |
| 5th Author's Name | Bonsang Gu |
| 5th Author's Affiliation | Electrical Eng. Dept., NanoBioElectronic Lab., Korean Advanced Inst. of Science and Technology |
| 6th Author's Name | Hyun Gyu Park |
| 6th Author's Affiliation | Chemical and Biomolecular Eng. Dept., Biochip & Biodevice Lab., Korean Advanced Inst. of Science and Technology |
| 7th Author's Name | Yang-Kyu Choi |
| 7th Author's Affiliation | Electrical Eng. Dept., NanoBioElectronic Lab., Korean Advanced Inst. of Science and Technology |
| Date | 2007/6/18 |
| Paper # | ED2007-126,SDM2007-131 |
| Volume (vol) | vol.107 |
| Number (no) | 110 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |