Presentation 2007/6/18
Fabrication and Properties of Metal-Ferroelectric-Semiconductor Devices Using Ferroelectric VF_2-TrFE Copolymer Films
Sang-Hyun Jeong, Soon-Won Jung, Haeng-Chul Choi, Hyung-Sun Yun, Kwang-Ho Kim,
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Abstract(in English) Metal-ferroelectric-semiconductor structures with ferroelectric vinylidene fluoride-trifluoroethylene (VF_2-TrFE) copolymer films were fabricated using spin coating method and demonstrated nonvolatile memory operations. VF_2-TrFE copolymer films were deposited on Si wafer at a spin rate of 2000~4000 rpm and dried on hot plate in air at 70℃. And then VF_2-TrFE copolymer films were annealed in a vacuum ambient at 150℃. X-ray diffraction results showed that the VF_2-TrFE films on Si substrates had β-phase of copolymer structures. The MFS capacitor on a p-type Si(100) wafer had a hysteresis curve with a clockwise rotation, which indicated ferroelectric polarization switching behavior. The dielectric constant was about 9. The typical measured remnant polarization (Pr) and coercive field (Ec) values were about 5.8 μC/cm^2 and 470 kV/cm, respectively. In case of fatigue, there was good polarization degradation property up to about 10^<11> switching cycles using 1 MHz square wave form at ±550kV/cm. Typical gate leakage current density of the MFS capacitor was the order of 10^6 A/cm^2 at the range of within 1 MV/cm, while the leakage current density of the MFIS capacitor was less than 2×10^<-8> A/cm^2 order in the same electric field.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) VF_2-TrFE copolymer / spin-coating / MFS / MFIS
Paper # ED2007-94,SDM2007-99
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Committee ED
Conference Date 2007/6/18(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication and Properties of Metal-Ferroelectric-Semiconductor Devices Using Ferroelectric VF_2-TrFE Copolymer Films
Sub Title (in English)
Keyword(1) VF_2-TrFE copolymer
Keyword(2) spin-coating
Keyword(3) MFS
Keyword(4) MFIS
1st Author's Name Sang-Hyun Jeong
1st Author's Affiliation Department of Semiconductor Engineering, Cheongju University()
2nd Author's Name Soon-Won Jung
2nd Author's Affiliation IT Convergence & Components Laboratory, Electronics and Telecommunications Research Institute
3rd Author's Name Haeng-Chul Choi
3rd Author's Affiliation Department of Semiconductor Engineering, Cheongju University
4th Author's Name Hyung-Sun Yun
4th Author's Affiliation Department of Semiconductor Engineering, Cheongju University
5th Author's Name Kwang-Ho Kim
5th Author's Affiliation Department of Semiconductor Engineering, Cheongju University
Date 2007/6/18
Paper # ED2007-94,SDM2007-99
Volume (vol) vol.107
Number (no) 110
Page pp.pp.-
#Pages 4
Date of Issue