Presentation 2007/6/18
Microscopic mechanism of resistance-switching-memory device based on metal oxides
Seungwu Han,
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Abstract(in English) Recently, the resistance switching in transition metal oxides has been attracting renewed interests because of its possible application to nonvolatile memory device. The relatively simple fabrication procedure compatible with the conventional semiconductor process is one of the strong merits of oxide-based resistance-changing random access memory (ReRAM). However, the basic mechanism of resistance switching is still not clear and it poses a big obstacle of the improving device performance. In this presentation, I am going to review recent experimental works on ReRAM and try to propose a microscopic model that can explain key features common to many ReRAM devices. Various experimental results indicate that the creation and migration of microscopic defects such as oxygen vacancies play an important role in stabilizing bi-resistance states. We will introduce a first-principles result which can explain the resistance switching based on the electromigration of the oxygen vacancy.
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Keyword(in English) ReRAM / mechanism / oxygen vacancy / electromigration
Paper # ED2007-93,SDM2007-98
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Committee ED
Conference Date 2007/6/18(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
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Title (in English) Microscopic mechanism of resistance-switching-memory device based on metal oxides
Sub Title (in English)
Keyword(1) ReRAM
Keyword(2) mechanism
Keyword(3) oxygen vacancy
Keyword(4) electromigration
1st Author's Name Seungwu Han
1st Author's Affiliation Dept. of Physics, Ewha Womans University()
Date 2007/6/18
Paper # ED2007-93,SDM2007-98
Volume (vol) vol.107
Number (no) 110
Page pp.pp.-
#Pages 191
Date of Issue