Presentation 2007/6/18
AlGaN/GaN Power Transistors for power switching applications
Yasuhiro Uemoto, Masahiro Hikita, Hiroaki Ueno, Tomohiro Murata, Hisayoshi Matsuo, Hidetoshi Ishida, Manabu Yanagihara, Tetsuzo Ueda, Tsuyoshi Tanaka, Daisuke Ueda,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Recently developed normally-off transistor named GIT (Gate Injection Transistor) and novel passivation technique using poly-AlN to uniform the surface temperature will be reviewed. We have developed a normally-off AlGaN/GaN transistor using conductivity modulation named GIT (Gate Injection Transistor). This new device principle utilizes hole-injection from p-AlGaN to AlGaN/GaN hetero-junction which increases electron density in the depleted channel resulting in dramatic increase of the drain current owing to the conductivity modulation. The fabricated GIT on Si substrate exhibits the threshold voltage of +1.0V with high maximum drain current of 200mA/mm. The obtained on-state resistance (R_・A) and off-state breakdown voltage (BV_) are 2.6mΩ・cm^2 and 640V, respectively. These values are the best ones ever reported for GaN-based normally-off transistors.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / Si substrate / normally-off / hole injection / conductivity modulation / high power switching
Paper # ED2007-71,SDM2007-76
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Conference Information
Committee ED
Conference Date 2007/6/18(1days)
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Registration To Electron Devices (ED)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) AlGaN/GaN Power Transistors for power switching applications
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Si substrate
Keyword(3) normally-off
Keyword(4) hole injection
Keyword(5) conductivity modulation
Keyword(6) high power switching
1st Author's Name Yasuhiro Uemoto
1st Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.()
2nd Author's Name Masahiro Hikita
2nd Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
3rd Author's Name Hiroaki Ueno
3rd Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
4th Author's Name Tomohiro Murata
4th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
5th Author's Name Hisayoshi Matsuo
5th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
6th Author's Name Hidetoshi Ishida
6th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
7th Author's Name Manabu Yanagihara
7th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
8th Author's Name Tetsuzo Ueda
8th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
9th Author's Name Tsuyoshi Tanaka
9th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
10th Author's Name Daisuke Ueda
10th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
Date 2007/6/18
Paper # ED2007-71,SDM2007-76
Volume (vol) vol.107
Number (no) 110
Page pp.pp.-
#Pages 6
Date of Issue