Presentation | 2007-06-07 Workfunction Tuning of B Doped Fully-Silicided Pd_2Si Gate Hiroyuki SHIRAISHI, Takuji HOSOI, Akio OHTA, Seiichi MIYAZAKI, Kentaro SHIBAHARA, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Pd_2Si is one of the FUSI (Fully Silicided) gate materials which are expected as a metal gate material. We have already reported workfunction tuning to positive direction by predoping of P, As or Sb to poly-Si. Predoping of B by implantation of BF^+_2 or B^+ resulted in workfunction shift to negative and positive directions, respectively. In addition to previous investigation on silicidation process, silicide composition and chemical bonding in the vicinity of the silicide/insulator interface were evaluated. Based on these knowledges, workfunction shift mechanism was discussed. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | metal gate / fully silicided gate / FUSI / work function / Pd_2Si |
Paper # | SDM2007-37 |
Date of Issue |
Conference Information | |
Committee | SDM |
---|---|
Conference Date | 2007/5/31(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Workfunction Tuning of B Doped Fully-Silicided Pd_2Si Gate |
Sub Title (in English) | |
Keyword(1) | metal gate |
Keyword(2) | fully silicided gate |
Keyword(3) | FUSI |
Keyword(4) | work function |
Keyword(5) | Pd_2Si |
1st Author's Name | Hiroyuki SHIRAISHI |
1st Author's Affiliation | Research Center for Nanodevices and Systems, Hiroshima University:Graduate School of Advanced Sciences of Matter, Hiroshima University() |
2nd Author's Name | Takuji HOSOI |
2nd Author's Affiliation | Research Center for Nanodevices and Systems, Hiroshima University |
3rd Author's Name | Akio OHTA |
3rd Author's Affiliation | Graduate School of Advanced Sciences of Matter, Hiroshima University |
4th Author's Name | Seiichi MIYAZAKI |
4th Author's Affiliation | Graduate School of Advanced Sciences of Matter, Hiroshima University |
5th Author's Name | Kentaro SHIBAHARA |
5th Author's Affiliation | Research Center for Nanodevices and Systems, Hiroshima University:Graduate School of Advanced Sciences of Matter, Hiroshima University |
Date | 2007-06-07 |
Paper # | SDM2007-37 |
Volume (vol) | vol.107 |
Number (no) | 85 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |