Presentation 2007/5/17
Single-electron-tunneling characteristics of SOI-MOSFETs with ultra thin Si layer doped Phosphorus
Daisuke NAGATA, Kazuhito EBISAWA, Daniel Moraru, Michiharu TABE,
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Abstract(in English) We have fabricated ultrathin SOI-MOSFETs doped with phosphorus and measured their electrical characteristics. We observed large coulomb blockade oscillations when the device size is decreased and P-dopant density is increased. Furthermore, we also observed different peak ratio of coulomb blockade oscillation for two devices with same channel size but difference doping density. These results indicate that P dopants play an important role on the formation of multiple tunnel junctions.
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Keyword(in English) coulomb blockade / dopant potential / random multiple tunnel junctions / single-electron transfer
Paper # ED2007-24,CPM2007-23,SDM2007-24
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Committee SDM
Conference Date 2007/5/17(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Single-electron-tunneling characteristics of SOI-MOSFETs with ultra thin Si layer doped Phosphorus
Sub Title (in English)
Keyword(1) coulomb blockade
Keyword(2) dopant potential
Keyword(3) random multiple tunnel junctions
Keyword(4) single-electron transfer
1st Author's Name Daisuke NAGATA
1st Author's Affiliation Research Institute of Electronics, Shizuoka University()
2nd Author's Name Kazuhito EBISAWA
2nd Author's Affiliation Research Institute of Electronics, Shizuoka University
3rd Author's Name Daniel Moraru
3rd Author's Affiliation Research Institute of Electronics, Shizuoka University
4th Author's Name Michiharu TABE
4th Author's Affiliation Research Institute of Electronics, Shizuoka University
Date 2007/5/17
Paper # ED2007-24,CPM2007-23,SDM2007-24
Volume (vol) vol.107
Number (no) 56
Page pp.pp.-
#Pages 4
Date of Issue