Presentation | 2007/5/17 Fabrication of SnO_2 thin films by the electrochemical deposition method Jun Wang, M. Ichimura, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The electrochemical deposition (ECD) method is promising for producing solar cells at low cost. We deposited SnO_2 thin films by ECD at room temperature. SnO_2 can be used as a window layer of the heterojunction cells and also for the dye-sensitization solar cells. Using an aqueous solution containing SnSO_4with pH lowered to 0.4 by HNO_3, we succeeded in deposition of SnO_2 thin films at room temperature. By blowing O_2 into the solution, transparent films were obtained. The film thickness was increased by stirring of the solution. From the photo-electrochemical measurement, we confirmed that the films have n-type conduction and photosensitivity. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | electrochemical deposition(ECD) / SnO_2 / solar cell |
Paper # | ED2007-20,CPM2007-19,SDM2007-20 |
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Conference Information | |
Committee | SDM |
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Conference Date | 2007/5/17(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of SnO_2 thin films by the electrochemical deposition method |
Sub Title (in English) | |
Keyword(1) | electrochemical deposition(ECD) |
Keyword(2) | SnO_2 |
Keyword(3) | solar cell |
1st Author's Name | Jun Wang |
1st Author's Affiliation | Dept. Eng. Phys., Electronics, Mech., Nagoya Institute of Technology() |
2nd Author's Name | M. Ichimura |
2nd Author's Affiliation | Dept. Eng. Phys., Electronics, Mech., Nagoya Institute of Technology |
Date | 2007/5/17 |
Paper # | ED2007-20,CPM2007-19,SDM2007-20 |
Volume (vol) | vol.107 |
Number (no) | 56 |
Page | pp.pp.- |
#Pages | 5 |
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