Presentation 2007/5/17
Characterization of plasma etching effects on GaN by electrical measurements of Schottky diodes
Masashi KATO, Kazuki MIKAMO, Masaya ICHIMURA, Masakazu KANECHIKA, Osamu ISHIGURO, Tetsu KACHI,
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Abstract(in English) Gallium Nitride (GaN) is a promising semiconductor material for high-power devices. For realization of the high-power devices, formation of p-type layer and plasma etching process are essential. In this work, we characterize plasma etching effects to p-type GaN using Schottky diodes. We employed current-voltage, capacitance-voltage, deep level transient spectroscopy and photocapacitance measurements. As a result, we observed a deep level located at Ec-0.25 eV in both n-type and p-type GaN. It is considered that this level corresponds to a deep level introduced by nitrogen vacancy and low-power plasma etching is effective to reduce introduction of this level.
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Keyword(in English) GaN / plasma etching / Schottky diode / DLTS / photocapacitance
Paper # ED2007-23,CPM2007-22,SDM2007-23
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Committee CPM
Conference Date 2007/5/17(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Characterization of plasma etching effects on GaN by electrical measurements of Schottky diodes
Sub Title (in English)
Keyword(1) GaN
Keyword(2) plasma etching
Keyword(3) Schottky diode
Keyword(4) DLTS
Keyword(5) photocapacitance
1st Author's Name Masashi KATO
1st Author's Affiliation Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology()
2nd Author's Name Kazuki MIKAMO
2nd Author's Affiliation Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology
3rd Author's Name Masaya ICHIMURA
3rd Author's Affiliation Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology
4th Author's Name Masakazu KANECHIKA
4th Author's Affiliation Toyota Central R&D Laboratories., Inc.
5th Author's Name Osamu ISHIGURO
5th Author's Affiliation Toyota Central R&D Laboratories., Inc.
6th Author's Name Tetsu KACHI
6th Author's Affiliation Toyota Central R&D Laboratories., Inc.
Date 2007/5/17
Paper # ED2007-23,CPM2007-22,SDM2007-23
Volume (vol) vol.107
Number (no) 55
Page pp.pp.-
#Pages 6
Date of Issue