Presentation 2007/5/17
Oxidation of a-CN_x:HF Films in Air by Ultraviolet Light Irradiation
Katsutoshi SAKURAI, Haruhisa KINOSHITA,
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Abstract(in English) Using polymer-like amorphous CN_x:H films deposited by supermagnetron plasma, ultraviolet-light irradiation effects were studied. Upper and lower electrode RF power (UPRF/LORF) was selected to 1/1 W or 5/5 W, and films were deposited using i-C_4H_<10>/N_2 plasma. Under exposure of 325 nm He-Cd laser, photoluminescence (PL) intensity was decreased and FT-IR absorbance spectrum was changed. Similar changes of FT-IR spectra were observed under Xe lamp exposure. In both cases, decrease of CH peal intensity and increase of OH and CO peak intensities were observed. By x-ray fluorescence spectroscopy (XFS) analysis, increase of O atom density and no change of N atom density were observed under UV light exposure.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) a-CN_x:H / photoluminescence / FT-IR / ultraviolet light / oxidation
Paper # ED2007-19,CPM2007-18,SDM2007-19
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Conference Information
Committee CPM
Conference Date 2007/5/17(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Oxidation of a-CN_x:HF Films in Air by Ultraviolet Light Irradiation
Sub Title (in English)
Keyword(1) a-CN_x:H
Keyword(2) photoluminescence
Keyword(3) FT-IR
Keyword(4) ultraviolet light
Keyword(5) oxidation
1st Author's Name Katsutoshi SAKURAI
1st Author's Affiliation Graduate School of Electronic Sciende and Technology, Shizuoka University()
2nd Author's Name Haruhisa KINOSHITA
2nd Author's Affiliation Research Institute of Electronics, Shizuoka University
Date 2007/5/17
Paper # ED2007-19,CPM2007-18,SDM2007-19
Volume (vol) vol.107
Number (no) 55
Page pp.pp.-
#Pages 4
Date of Issue