Presentation 2007/5/17
Analysis of plasma etching damages and characterization of annealing effects on GaN by excess carrier measurements
Keisuke Fukushima, Masashi Kato, Masaya Ichimura, Masakazu Kanechika, Osamu Ishiguro, Tetsu Kachi,
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Abstract(in English) Gallium (GaN) is promising for high power and high frequency devices, and the etching processes is necessary in bipolar device fabrication. Inductively coupled plasma (ICP) etching is one of the plasma etching techniques which also forms a damage layer on the sample surface. In this work, we have measured the excess carrier lifetime in ICP etched GaN with the microwave photoconductivity decay (μ-PCD) method. We analyzed levels introduced by ICP etching by measuring temperature dependence of the decay curves. We annealed ICP etched GaN, and discussed effects of annealing on the etching damage by observing the change of the excess carrier lifetime.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Gallium nitride / carrier lifetime / μ-PCD method / ICP / decay curve / temperature dependence / annealing
Paper # ED2007-13,CPM2007-12,SDM2007-13
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Committee CPM
Conference Date 2007/5/17(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Analysis of plasma etching damages and characterization of annealing effects on GaN by excess carrier measurements
Sub Title (in English)
Keyword(1) Gallium nitride
Keyword(2) carrier lifetime
Keyword(3) μ-PCD method
Keyword(4) ICP
Keyword(5) decay curve
Keyword(6) temperature dependence
Keyword(7) annealing
1st Author's Name Keisuke Fukushima
1st Author's Affiliation Nagoya institute of technology()
2nd Author's Name Masashi Kato
2nd Author's Affiliation Nagoya institute of technology
3rd Author's Name Masaya Ichimura
3rd Author's Affiliation Nagoya institute of technology
4th Author's Name Masakazu Kanechika
4th Author's Affiliation Toyota Central Labs.,Inc.
5th Author's Name Osamu Ishiguro
5th Author's Affiliation Toyota Central Labs.,Inc.
6th Author's Name Tetsu Kachi
6th Author's Affiliation Toyota Central Labs.,Inc.
Date 2007/5/17
Paper # ED2007-13,CPM2007-12,SDM2007-13
Volume (vol) vol.107
Number (no) 55
Page pp.pp.-
#Pages 6
Date of Issue