Presentation 2007-01-19
A Normally-Off AlGaN/GaN Transistor with Low On-State Resistance Using Hole-Injection
Yasuhiro Uemoto, Masahiro Hikita, Hiroaki Ueno, Hisayoshi Matsuo, Hidetoshi Ishida, Manabu Yanagihara, Tetsuzo Ueda, Tsuyoshi Tanaka, Daisuke Ueda,
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Abstract(in English) We report a normally-off GaN-based transistor using conductivity modulation, which we call GIT (Gate Injection Transistor). This new device principle utilizes hole-injection from p-AlGaN to AlGaN/GaN hetero-junction, which increases electron density in the depleted channel resulting in dramatic increase of the drain current owing to the conductivity modulation. The fabricated GIT exhibits the threshold voltage of 1.0V with high maximum drain current of 200mA/mm. The obtained on-state resistance (R_・A) and off-state breakdown voltage (BV_) are 2.6mΩ・cm^2 and 640V, respectively. These values are the best ones ever reported for GaN-based normally-off transistors.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / Si substrate / hole injection / conductivity modulation / high power switching device / low specific on-state resistance / high breakdown voltage
Paper # ED2006-235,MW2006-188
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Committee ED
Conference Date 2007/1/10(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A Normally-Off AlGaN/GaN Transistor with Low On-State Resistance Using Hole-Injection
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Si substrate
Keyword(3) hole injection
Keyword(4) conductivity modulation
Keyword(5) high power switching device
Keyword(6) low specific on-state resistance
Keyword(7) high breakdown voltage
1st Author's Name Yasuhiro Uemoto
1st Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.()
2nd Author's Name Masahiro Hikita
2nd Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
3rd Author's Name Hiroaki Ueno
3rd Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
4th Author's Name Hisayoshi Matsuo
4th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
5th Author's Name Hidetoshi Ishida
5th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
6th Author's Name Manabu Yanagihara
6th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
7th Author's Name Tetsuzo Ueda
7th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
8th Author's Name Tsuyoshi Tanaka
8th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
9th Author's Name Daisuke Ueda
9th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
Date 2007-01-19
Paper # ED2006-235,MW2006-188
Volume (vol) vol.106
Number (no) 459
Page pp.pp.-
#Pages 5
Date of Issue