| Presentation | 2007-01-18 A Study on Material Measurement Methods Using FDTD Simulation Techniques : Measurements of Surface Resistance of Metals and Dielectric Plates Including Semiconductor Wafer in Millimeter-wave Range Yukio IIDA, Koichi NAKAO, Yasuhisa OMURA, Susumu TAMURA, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The measurement method of the electromagnetic wave material supported by the FDTD electromagnetic field simulation technique is studied. First of all, a result of the dielectric measurement using the rectangular cavity resonator is shown, and the problem of the restriction to the material configuration is examined. Next, a measurement method of the metal surface resistance using a NRD guide resonator is proposed. Finally, the measurement method for the semiconductor wafers and dielectric plates is studied. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Micro- and millimeter-wave / Measurement method / Electromagnetic-wave-materials / Dielectric substrate / Semiconductor wafer / Conductor surface resistance |
| Paper # | ED2006-221,MW2006-174 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2007/1/10(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A Study on Material Measurement Methods Using FDTD Simulation Techniques : Measurements of Surface Resistance of Metals and Dielectric Plates Including Semiconductor Wafer in Millimeter-wave Range |
| Sub Title (in English) | |
| Keyword(1) | Micro- and millimeter-wave |
| Keyword(2) | Measurement method |
| Keyword(3) | Electromagnetic-wave-materials |
| Keyword(4) | Dielectric substrate |
| Keyword(5) | Semiconductor wafer |
| Keyword(6) | Conductor surface resistance |
| 1st Author's Name | Yukio IIDA |
| 1st Author's Affiliation | ORDIST, Faculty of Engineering, Kansai University() |
| 2nd Author's Name | Koichi NAKAO |
| 2nd Author's Affiliation | Faculty of Engineering, Kansai University |
| 3rd Author's Name | Yasuhisa OMURA |
| 3rd Author's Affiliation | ORDIST, Faculty of Engineering, Kansai University |
| 4th Author's Name | Susumu TAMURA |
| 4th Author's Affiliation | ORDIST, Faculty of Engineering, Kansai University |
| Date | 2007-01-18 |
| Paper # | ED2006-221,MW2006-174 |
| Volume (vol) | vol.106 |
| Number (no) | 459 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |