Presentation 2007-01-19
Improvement of Layout Analysis by Connecting Emission or OBIRCH signals to CAD Information
Akira SHIMASE, Akihito UCHIKADO, Mitsuaki SAEKI, Shinichi WATARAI, Takeshi SUZUKI, Toshiyuki MAJIMA, Kazuhiro HOTTA, Hirotoshi TERADA,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Recent progress of LSI technology makes failure analysis more difficult. One of the difficulties is connecting sites of signal detected by emission microscope or OBRICH analysis tool to nets on layout data. "Failure Analysis Navigation System (=FA-Navigation System) is developed to make this routine work easier. The system sends sites of the signals to a layout viewer to extract nets passing through the signal areas and displays how many signals are contained in each net for assisting operator's judgment to pick up suspicious nets. This paper will present outline of the system, basic functions and new functions of the system.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Emission analysis / OBIRCH analysis / Layout analysis / CAD data / Net extraction / Assisting failure analysis
Paper # CPM2006-146,ICD2006-188
Date of Issue

Conference Information
Committee ICD
Conference Date 2007/1/11(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Integrated Circuits and Devices (ICD)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Improvement of Layout Analysis by Connecting Emission or OBIRCH signals to CAD Information
Sub Title (in English)
Keyword(1) Emission analysis
Keyword(2) OBIRCH analysis
Keyword(3) Layout analysis
Keyword(4) CAD data
Keyword(5) Net extraction
Keyword(6) Assisting failure analysis
1st Author's Name Akira SHIMASE
1st Author's Affiliation Renesas Technology Corp.()
2nd Author's Name Akihito UCHIKADO
2nd Author's Affiliation Renesas Technology Corp.
3rd Author's Name Mitsuaki SAEKI
3rd Author's Affiliation Renesas Technology Corp.
4th Author's Name Shinichi WATARAI
4th Author's Affiliation Renesas Technology Corp.
5th Author's Name Takeshi SUZUKI
5th Author's Affiliation Renesas Technology Corp.
6th Author's Name Toshiyuki MAJIMA
6th Author's Affiliation Renesas Technology Corp.
7th Author's Name Kazuhiro HOTTA
7th Author's Affiliation Hamamatsu Photonics K.K.
8th Author's Name Hirotoshi TERADA
8th Author's Affiliation Hamamatsu Photonics K.K.
Date 2007-01-19
Paper # CPM2006-146,ICD2006-188
Volume (vol) vol.106
Number (no) 468
Page pp.pp.-
#Pages 6
Date of Issue