Presentation 2007-01-30
Fabrication and Evaluation of Band-Selection Interleaver on Silicon Waveguide
Junya MATSUI, Soichiro HONDA, Zhigang WU, Katsuyuki UTAKA, Tomohiko EDURA, Masahide TOKUDA, Ken TSUTSUI, Yasuo WADA,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) With the increase of communication traffic by WDM, low-cost and high-performance filter devices using a silicon-on-insulator (SOI) substrate attract attention. We fabricated the Michelson Interferometer-type filter which works as a WDM interleaver consisting of large coupling coefficient Si grating made by Deep-RIE. As a result, we obtained the results of an FSR of about 0.8nm and an extinction ratio of about 18dB for the interleaver, and a transmission contrast of about 20dB for the grating. In addition, we formed electrode on both a grating and a waveguide and confirmed tuning by thermooptic effect.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) WDM / SOI / Bragg Grating / Filter Device / Interleaver / Thermooptic Effect / Tuning / Michelson Interferometer
Paper # PN2006-66,OPE2006-148,LQE2006-137
Date of Issue

Conference Information
Committee PN
Conference Date 2007/1/22(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Photonic Network (PN)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication and Evaluation of Band-Selection Interleaver on Silicon Waveguide
Sub Title (in English)
Keyword(1) WDM
Keyword(2) SOI
Keyword(3) Bragg Grating
Keyword(4) Filter Device
Keyword(5) Interleaver
Keyword(6) Thermooptic Effect
Keyword(7) Tuning
Keyword(8) Michelson Interferometer
1st Author's Name Junya MATSUI
1st Author's Affiliation Department of Science and Engineering, Waseda University()
2nd Author's Name Soichiro HONDA
2nd Author's Affiliation Department of Science and Engineering, Waseda University
3rd Author's Name Zhigang WU
3rd Author's Affiliation Department of Science and Engineering, Waseda University
4th Author's Name Katsuyuki UTAKA
4th Author's Affiliation Department of Science and Engineering, Waseda University
5th Author's Name Tomohiko EDURA
5th Author's Affiliation Nano Technology Research Center, Waseda University
6th Author's Name Masahide TOKUDA
6th Author's Affiliation Nano Technology Research Center, Waseda University
7th Author's Name Ken TSUTSUI
7th Author's Affiliation Nano Technology Research Center, Waseda University
8th Author's Name Yasuo WADA
8th Author's Affiliation Nano Technology Research Center, Waseda University
Date 2007-01-30
Paper # PN2006-66,OPE2006-148,LQE2006-137
Volume (vol) vol.106
Number (no) 513
Page pp.pp.-
#Pages 4
Date of Issue