Presentation 2007-01-29
Three-dimensional fabrication of photoresist using holographic two-photon microfabrication
Hidetomo TAKAHASHI, Maki NISHITANI, Yoshio HAYASAKI,
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Abstract(in English) Holographic two-photon micro fabrication method performs high-speed parallel processing inside photoresist using a computer-generated hologram displayed on the liquid crystal spatial light modulator. Switching of the computer-generated hologram performs arbitrary and variable parallel processing. We demonstrate the micro fabrication with a linear structure and a three-dimensional fabrication using a combination the holographic parallel irradiation with the lateral translation of sample stage.
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Keyword(in English) Liquid crystal spatial light modulator / Femtosecond pulse laser / Computer-generated hologram / Photoresist
Paper # PN2006-50,OPE2006-132,LQE2006-121
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Committee PN
Conference Date 2007/1/22(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Three-dimensional fabrication of photoresist using holographic two-photon microfabrication
Sub Title (in English)
Keyword(1) Liquid crystal spatial light modulator
Keyword(2) Femtosecond pulse laser
Keyword(3) Computer-generated hologram
Keyword(4) Photoresist
1st Author's Name Hidetomo TAKAHASHI
1st Author's Affiliation Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima()
2nd Author's Name Maki NISHITANI
2nd Author's Affiliation Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
3rd Author's Name Yoshio HAYASAKI
3rd Author's Affiliation Department of Optical Science and Technology, Faculty of Engineering, The University of Tokushima
Date 2007-01-29
Paper # PN2006-50,OPE2006-132,LQE2006-121
Volume (vol) vol.106
Number (no) 513
Page pp.pp.-
#Pages 6
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