Presentation 2006-11-24
Fabrication of iron silicides photonic crystals
Shunsuke KUNIMATSU, Akifumi IMAI, Kensuke AKIYAMA, Yoshihito MAEDA,
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Abstract(in English) There are some iron silicides with semiconducting, ferromagnetic and metallic properties. β-FeSi_2 with a high refractive index of more than 5.2 has been expected application to high contrast photonic crystals. However, the etching rate of β-FeSi_2 film is too low to obtain the sufficient etching selectivity against metal masks employed in lift-off processes. In this study, we have improved both the etching rate and the selectivity by dry etching processes using magnetic neutral loop discharge plasma at low pressure. We have succeeded in fabricating β-FeSi_2 photonic crystals.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Semiconducting silicide / Reactive ion etching / Photonic crystal / β-FeSi_2
Paper # R2006-32,ED2006-177,SDM2006-195
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Committee SDM
Conference Date 2006/11/17(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of iron silicides photonic crystals
Sub Title (in English)
Keyword(1) Semiconducting silicide
Keyword(2) Reactive ion etching
Keyword(3) Photonic crystal
Keyword(4) β-FeSi_2
1st Author's Name Shunsuke KUNIMATSU
1st Author's Affiliation Department of Energy Science and Technology, Kyoto University()
2nd Author's Name Akifumi IMAI
2nd Author's Affiliation Department of Energy Science and Technology, Kyoto University
3rd Author's Name Kensuke AKIYAMA
3rd Author's Affiliation Kanagawa Industrial Technology Center
4th Author's Name Yoshihito MAEDA
4th Author's Affiliation Department of Energy Science and Technology, Kyoto University
Date 2006-11-24
Paper # R2006-32,ED2006-177,SDM2006-195
Volume (vol) vol.106
Number (no) 379
Page pp.pp.-
#Pages 4
Date of Issue