| Presentation | 2006-11-09 Thermal Stability and Morphology of Interfaces in Cu/ZrN/SiOC/Si systems Atsushi NOYA, Masaru SATO, Mayumi B. TAKEYAMA, Eiji AOYAGI, |
|---|---|
| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A thin 5-nm-thick ZrN film was applied to a model system of the downscaled Cu interconnect with a SiOC field-insulating layer of low-k material as an extremely thin diffusion barrier. Thermal stability and morphology of interfaces in the Cu/ZrN/SiOC/Si system were examined. Upon annealing at 500℃ for 30 min, the ZrN barrier was fairly stable without intermixing, diffusion and/or reaction at every interface. Exceptionally, increased undulation of the SiOC surface was evident in a local area under TEM observation, which is probably caused by grain growth of ZrN. Absence of sacrifice of the extremely thin barrier owing to solid-phase diffusion, intermixing and/or reaction was evident, indicating that the present ZrN film was a promising material for the extremely thin barrier for forthcoming metallization technology. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | diffusion barrier / ZrN / interfacial layer / nanocrystal film |
| Paper # | CPM2006-119 |
| Date of Issue |
| Conference Information | |
| Committee | CPM |
|---|---|
| Conference Date | 2006/11/2(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Thermal Stability and Morphology of Interfaces in Cu/ZrN/SiOC/Si systems |
| Sub Title (in English) | |
| Keyword(1) | diffusion barrier |
| Keyword(2) | ZrN |
| Keyword(3) | interfacial layer |
| Keyword(4) | nanocrystal film |
| 1st Author's Name | Atsushi NOYA |
| 1st Author's Affiliation | Faculty of Engineering, Kitami Institute of Technology() |
| 2nd Author's Name | Masaru SATO |
| 2nd Author's Affiliation | Faculty of Engineering, Kitami Institute of Technology |
| 3rd Author's Name | Mayumi B. TAKEYAMA |
| 3rd Author's Affiliation | Faculty of Engineering, Kitami Institute of Technology |
| 4th Author's Name | Eiji AOYAGI |
| 4th Author's Affiliation | Institute for Materials Research, Tohoku University |
| Date | 2006-11-09 |
| Paper # | CPM2006-119 |
| Volume (vol) | vol.106 |
| Number (no) | 336 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |