| Presentation | 2006-11-09 Fabrication of Cr_2O_3 Thin Film by RF Magnetron Sputtering Takeshi ASADA, Kenjirou NAGASE, Takayuki YAMADA, Nobuyuki IWATA, Hiroshi YAMAMOTO, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We propose application of magnetoelectric (ME) materials. ME material thin films are expected to be current or magnetic source for various nano-device. Adopting ME materials to single flux quantum (SFQ) device can exclude base source current sources. However, such the experimental reports were quite few. It is the reason that the crystal structure of high temperature superconductors or substrates were different from that of ME materials. We focused Cr_2O_3 as the representative among ME materials and its epitaxy for R-cut sapphire and Nb-SrTiO_3 (Nb-STO). The Cr_2O_3 films were prepared by RF magnetron sputtering method. A strong Bragg refection peak from Cr_2O_3 (10-12) was observed on the sapphire substrate. Then the peak intensity and full width at half maximum of rocking curve (10-12) were the largest and the smallest in the sample deposited on 500℃ substrate. The results of surface morphology were showed step and terrace structure. The steps height were 0.31～0.40nm same to that of lattice spacing of (10-12) plane at 550℃. Cr_2O_3 films deposited on STO with the buffer layer of CeO_2 revealed c-axis oriented growth and we expect to obtain the epitaxial multilayered films by optimizing growth condition of CeO_2. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ME effect / SFQ / Cr_2O_3 / epitaxial growth / CeO_2 / Nb-STO |
| Paper # | CPM2006-115 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2006/11/2(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of Cr_2O_3 Thin Film by RF Magnetron Sputtering |
| Sub Title (in English) | |
| Keyword(1) | ME effect |
| Keyword(2) | SFQ |
| Keyword(3) | Cr_2O_3 |
| Keyword(4) | epitaxial growth |
| Keyword(5) | CeO_2 |
| Keyword(6) | Nb-STO |
| 1st Author's Name | Takeshi ASADA |
| 1st Author's Affiliation | College of Science & Technology, Nihon University() |
| 2nd Author's Name | Kenjirou NAGASE |
| 2nd Author's Affiliation | College of Science & Technology, Nihon University |
| 3rd Author's Name | Takayuki YAMADA |
| 3rd Author's Affiliation | College of Science & Technology, Nihon University |
| 4th Author's Name | Nobuyuki IWATA |
| 4th Author's Affiliation | College of Science & Technology, Nihon University |
| 5th Author's Name | Hiroshi YAMAMOTO |
| 5th Author's Affiliation | College of Science & Technology, Nihon University |
| Date | 2006-11-09 |
| Paper # | CPM2006-115 |
| Volume (vol) | vol.106 |
| Number (no) | 336 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |