Presentation 2006-10-06
Epitaxial growth and optical properties of InGaN/GaN quantum wells on semipolar {11-22} GaN bulk crystals
Masaya Ueda, Kazunobu Kojima, Mitsuru Funato, Yoichi Kawakami, Yukio Narukawa, Takashi Mukai,
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Abstract(in English) GaN and InGaN/GaN multiple quantum well (MQW) are grown on semipolar (11-22) GaN bulk substrates by metalorganic vapor phase epitaxy. The GaN homoepitaxial layer has an atomically flat surface. Optical reflection measurements revealed the polarization anisotropy for the A, B, and C excitons. Free A excitons dominate photoluminescence (PL) spectrum at 10K, accompanied by a weaker, sharp doublet emission due to neutral donor-bound excitons. The InGaN/GaN MQW grown on it involves fast radiative recombination processes; the PL decay monitored at 428nm is fitted with a double exponential curve, which has lifetimes of 46ps and 142ps at 10K. These values are two-orders of magnitude shorter than those in conventional (0001) QWs and can be attributed to the weakened internal electric fields. The emission from the MQW is polarized along the [1-100] direction with a polarization degree of 0.69, due to the low crystal symmetry.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) semipolar {11-22} / GaN / InGaN/GaN quantum wells / metalorganic vapor phase epitaxy
Paper # ED2006-162,CPM2006-99,LQE2006-66
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Committee LQE
Conference Date 2006/9/28(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Epitaxial growth and optical properties of InGaN/GaN quantum wells on semipolar {11-22} GaN bulk crystals
Sub Title (in English)
Keyword(1) semipolar {11-22}
Keyword(2) GaN
Keyword(3) InGaN/GaN quantum wells
Keyword(4) metalorganic vapor phase epitaxy
1st Author's Name Masaya Ueda
1st Author's Affiliation Department of Electronic Science and Engineering, Kyoto University()
2nd Author's Name Kazunobu Kojima
2nd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
3rd Author's Name Mitsuru Funato
3rd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
4th Author's Name Yoichi Kawakami
4th Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
5th Author's Name Yukio Narukawa
5th Author's Affiliation Nitride Semiconductor Research Lab. Nichia Corporation
6th Author's Name Takashi Mukai
6th Author's Affiliation Nitride Semiconductor Research Lab. Nichia Corporation
Date 2006-10-06
Paper # ED2006-162,CPM2006-99,LQE2006-66
Volume (vol) vol.106
Number (no) 271
Page pp.pp.-
#Pages 5
Date of Issue