Presentation 2006-10-05
Interface control for GaN-based devices
T. Kimura, J. Kotani, H. Kato, M. Tajima, E. Ogawa, C. Mizue, T. Hashizume,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) This paper presents formation and characterization of the interface structures for improvement device performance and stability. First, we propose a surface control process using an ultrathin Al layer for suppressing oxygen impurity from the AlGaN surface. The AlGaN/GaN HEMT with the surface process showed the pronounced reduction of gate leakage currents and the excellent endurance against the temperature and bias stress. Then, we prepared the CN/n-GaN structure by ECRCVD. The deposition of a thin CN layer on GaN brought the reduction of surface potential at the GaN surface. It was also found that the surface resistivity of n-GaN increased after annealing the SiN/CN/n-GaN structure at 1000℃.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / AlGaN / Schottky / leakage current / operation stability / surface process / oxygen / CN
Paper # ED2006-157,CPM2006-94,LQE2006-61
Date of Issue

Conference Information
Committee LQE
Conference Date 2006/9/28(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Interface control for GaN-based devices
Sub Title (in English)
Keyword(1) GaN
Keyword(2) AlGaN
Keyword(3) Schottky
Keyword(4) leakage current
Keyword(5) operation stability
Keyword(6) surface process
Keyword(7) oxygen
Keyword(8) CN
1st Author's Name T. Kimura
1st Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University()
2nd Author's Name J. Kotani
2nd Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
3rd Author's Name H. Kato
3rd Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
4th Author's Name M. Tajima
4th Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
5th Author's Name E. Ogawa
5th Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
6th Author's Name C. Mizue
6th Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
7th Author's Name T. Hashizume
7th Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University
Date 2006-10-05
Paper # ED2006-157,CPM2006-94,LQE2006-61
Volume (vol) vol.106
Number (no) 271
Page pp.pp.-
#Pages 6
Date of Issue