Presentation 2006-10-05
Study on crystal growth of AlGaN/GaN HEMT on SiC substrate
Takahiko IWASAKI, Hiroyasu ISHIKAWA, Takashi EGAWA,
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Abstract(in English) AlGaN/GaN HEMT is a promising candidate for next generation high-power and high-frequency devices. In our study to improve electron mobility, MOCVD method was used to grow AlGaN/GaN HEMT structure on SiC substrate. In the investigation of AlN initial layer thickness dependence, AlN initial layer with 100nm thickness shows very good electron mobility of 1568cm^2/Vs at RT. Furthermore, in our study with the insertion of AlN spacer layer and its thickness dependence, high electron mobility of 2189cm^2/Vs at RT and 20998cm^2/Vs at 77K were obtained.
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Keyword(in English) SiC substrate / GaN / AlGaN/GaN / MOCVD / HEMT
Paper # ED2006-155,CPM2006-92,LQE2006-59
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Committee LQE
Conference Date 2006/9/28(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Study on crystal growth of AlGaN/GaN HEMT on SiC substrate
Sub Title (in English)
Keyword(1) SiC substrate
Keyword(2) GaN
Keyword(3) AlGaN/GaN
Keyword(4) MOCVD
Keyword(5) HEMT
1st Author's Name Takahiko IWASAKI
1st Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology()
2nd Author's Name Hiroyasu ISHIKAWA
2nd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
3rd Author's Name Takashi EGAWA
3rd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
Date 2006-10-05
Paper # ED2006-155,CPM2006-92,LQE2006-59
Volume (vol) vol.106
Number (no) 271
Page pp.pp.-
#Pages 4
Date of Issue