Presentation | 2006-10-05 Study on crystal growth of AlGaN/GaN HEMT on SiC substrate Takahiko IWASAKI, Hiroyasu ISHIKAWA, Takashi EGAWA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | AlGaN/GaN HEMT is a promising candidate for next generation high-power and high-frequency devices. In our study to improve electron mobility, MOCVD method was used to grow AlGaN/GaN HEMT structure on SiC substrate. In the investigation of AlN initial layer thickness dependence, AlN initial layer with 100nm thickness shows very good electron mobility of 1568cm^2/Vs at RT. Furthermore, in our study with the insertion of AlN spacer layer and its thickness dependence, high electron mobility of 2189cm^2/Vs at RT and 20998cm^2/Vs at 77K were obtained. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | SiC substrate / GaN / AlGaN/GaN / MOCVD / HEMT |
Paper # | ED2006-155,CPM2006-92,LQE2006-59 |
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Conference Information | |
Committee | LQE |
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Conference Date | 2006/9/28(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Lasers and Quantum Electronics (LQE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Study on crystal growth of AlGaN/GaN HEMT on SiC substrate |
Sub Title (in English) | |
Keyword(1) | SiC substrate |
Keyword(2) | GaN |
Keyword(3) | AlGaN/GaN |
Keyword(4) | MOCVD |
Keyword(5) | HEMT |
1st Author's Name | Takahiko IWASAKI |
1st Author's Affiliation | Research Center for Nano-Device and System, Nagoya Institute of Technology() |
2nd Author's Name | Hiroyasu ISHIKAWA |
2nd Author's Affiliation | Research Center for Nano-Device and System, Nagoya Institute of Technology |
3rd Author's Name | Takashi EGAWA |
3rd Author's Affiliation | Research Center for Nano-Device and System, Nagoya Institute of Technology |
Date | 2006-10-05 |
Paper # | ED2006-155,CPM2006-92,LQE2006-59 |
Volume (vol) | vol.106 |
Number (no) | 271 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |