Presentation | 2006/9/1 On the existence of the template layer guiding the low-resistivity ITO films by plasma sputtering Akihiko KONO, Fumiya SHOJI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We have studied the effect of substrate temperature on the electrical properties of tin-doped indium oxide films by the low pressure plasma sputtering. In thick films (>100nm), the carrier density of the films on heated substrates increased by approximately three times compared with those of films on unheated substrates. As a result, low-resistivity (9.8×10^<-5>Ωcm) ITO films were obtained on the heated substrates. Furthermore, there was evidence that anomalous behavior of carrier density existed in thin thickness range (0~40nm) irrespective of the substrate temperature. The existence of the template layer guiding the low-resistivity ITO films was strongly suggested from changes of number of carriers as a function of the film thickness. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | ITO film / Plasma sputtering |
Paper # | ED2006-144,OME2006-69 |
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Committee | OME |
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Conference Date | 2006/9/1(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Organic Material Electronics (OME) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | On the existence of the template layer guiding the low-resistivity ITO films by plasma sputtering |
Sub Title (in English) | |
Keyword(1) | ITO film |
Keyword(2) | Plasma sputtering |
1st Author's Name | Akihiko KONO |
1st Author's Affiliation | Facutly of Engineering, Kyusyu Kyoritsu University() |
2nd Author's Name | Fumiya SHOJI |
2nd Author's Affiliation | Facutly of Engineering, Kyusyu Kyoritsu University |
Date | 2006/9/1 |
Paper # | ED2006-144,OME2006-69 |
Volume (vol) | vol.106 |
Number (no) | 228 |
Page | pp.pp.- |
#Pages | 5 |
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