Presentation 2006-09-26
Ballistic Transport in Nanoscale MOSFETs
Hideaki TSUCHIYA, Kazuya FUJII, Takashi Mori, Tanroku MIYOSHI,
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Abstract(in English) Quasi-ballistic transport is one of the technology boosters for drive current enhancement of Si-MOSFETs. In this paper, to explore its ultimate device performance we study a quasi-ballistic transport in nanoscale Si-MOSFETs based upon a quantum-corrected Monte Carlo device simulation. We found that when a channel length becomes shorter than 30nm, an electron average velocity at source-end of channel increases due to ballistic transport effects, and then it approaches a ballistic limit in the sub-10nm regime. We also demonstrated that ballistic transport indexes estimated by our simulation agree well with recent experimental results.
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Keyword(in English) nanoscale MOSFET / quantum effects / quasi-ballistic transport / quantum-corrected Monte Carlo method
Paper # VLD2006-47,SDM2006-168
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Committee VLD
Conference Date 2006/9/19(1days)
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Registration To VLSI Design Technologies (VLD)
Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Ballistic Transport in Nanoscale MOSFETs
Sub Title (in English)
Keyword(1) nanoscale MOSFET
Keyword(2) quantum effects
Keyword(3) quasi-ballistic transport
Keyword(4) quantum-corrected Monte Carlo method
1st Author's Name Hideaki TSUCHIYA
1st Author's Affiliation Faculty of Engineering, Kobe University()
2nd Author's Name Kazuya FUJII
2nd Author's Affiliation Faculty of Engineering, Kobe University
3rd Author's Name Takashi Mori
3rd Author's Affiliation Faculty of Engineering, Kobe University
4th Author's Name Tanroku MIYOSHI
4th Author's Affiliation Faculty of Engineering, Kobe University
Date 2006-09-26
Paper # VLD2006-47,SDM2006-168
Volume (vol) vol.106
Number (no) 255
Page pp.pp.-
#Pages 6
Date of Issue