| Presentation | 2006-08-25 Development of Surface-Wave Enhanced Plasma Apparatus and Application to Semiconductor Processing Haruki SHOJI, Hisashi FUKUDA, Masakazu FURUKAWA, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have developed a high-density surface-wave enhanced plasma apparatus for applications to next generation semiconductor fabrication processing. In this study, silicon insulating films deposited below 400℃ were evaluated in the view of the composition and their electronic device application. The silicon nitride films showed the water vapor transmission rate (WVTR) of 0.23g/m^2・day applicable to coating film. The silicon dioxide films indicated low leakage current below 7.5×10^<-9>A to realize near-to-eye microdisplay. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Chemical vapor deposition / Surface-wave plasma / Silicon nitride film / Silicon dioxide film |
| Paper # | EMD2006-37,CPM2006-67,OPE2006-79,LQE2006-44 |
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| Conference Information | |
| Committee | LQE |
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| Conference Date | 2006/8/17(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Lasers and Quantum Electronics (LQE) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Development of Surface-Wave Enhanced Plasma Apparatus and Application to Semiconductor Processing |
| Sub Title (in English) | |
| Keyword(1) | Chemical vapor deposition |
| Keyword(2) | Surface-wave plasma |
| Keyword(3) | Silicon nitride film |
| Keyword(4) | Silicon dioxide film |
| 1st Author's Name | Haruki SHOJI |
| 1st Author's Affiliation | Faculty of Engineering, Muroran Institute of Technology() |
| 2nd Author's Name | Hisashi FUKUDA |
| 2nd Author's Affiliation | Faculty of Engineering, Muroran Institute of Technology |
| 3rd Author's Name | Masakazu FURUKAWA |
| 3rd Author's Affiliation | Faculty of Engineering, Muroran Institute of Technology |
| Date | 2006-08-25 |
| Paper # | EMD2006-37,CPM2006-67,OPE2006-79,LQE2006-44 |
| Volume (vol) | vol.106 |
| Number (no) | 215 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |