Presentation 2006/6/26
Physical Origin of Stress-Induced Leakage Currents in Ultra-Thin Silicon Dioxide Films(Session 9A Silicon Devices VI)
Tetsuo Endoh, Kazuyuki Hirose, Kenji Shiraishi,
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Abstract(in English) Physical origin of stress-induced leakage currents (SILC) in ultra-thin SiO2 films is described. Assuming a two-step trap-assisted tunneling process accompanied with an energy relaxation process of trapped electrons, conditions of trap sites which are origin of SICL are quantitatively found. It is proposed that the trap site location and the trap state energy can be explained by mean-free-path of hole in SiO2 films and atomic structure of trap site by O vacancy model.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) SILC / Stress-Induced Leakage Current / SiO2 / Ultra Thin Silicon Dioxide / mean-free-path / O vacancy model
Paper # ED2006-111,SDM2006-119
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Committee SDM
Conference Date 2006/6/26(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Physical Origin of Stress-Induced Leakage Currents in Ultra-Thin Silicon Dioxide Films(Session 9A Silicon Devices VI)
Sub Title (in English)
Keyword(1) SILC
Keyword(2) Stress-Induced Leakage Current
Keyword(3) SiO2
Keyword(4) Ultra Thin Silicon Dioxide
Keyword(5) mean-free-path
Keyword(6) O vacancy model
1st Author's Name Tetsuo Endoh
1st Author's Affiliation Research Institute of Electrical Communication, Tohoku University()
2nd Author's Name Kazuyuki Hirose
2nd Author's Affiliation Institute of Space and Astronautical Science, JAXA
3rd Author's Name Kenji Shiraishi
3rd Author's Affiliation Graduate School of Pure & Applied physics, University of Tsukuba
Date 2006/6/26
Paper # ED2006-111,SDM2006-119
Volume (vol) vol.106
Number (no) 138
Page pp.pp.-
#Pages 6
Date of Issue