Presentation 2006/6/26
Investigation of Gate Misalignment Effects in FinFETs(Session 7A Silicon Devices IV,AWAD2006)
Kuk-Hwan Kim, Jin-Woo Han, Yang-Kyu Choi,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Gate misalignment effects on electrical properties of FinFETs have been investigated with three-dimensional (3-D) mixed-mode simulator. A major trade-off between S/D series resistances and diffusion capacitances was induced by the gate misalignment. The influences of series resistances on short channel effects of few tens nanometer device are discussed in detail. A SOI FinFET and a body-tied FinFET were compared in terms of FO4 inverter delay to assess the gate misalignment effects on circuit performance as a whole. In the SOI FinFET, source series resistance is dominant factor in determining RC delay, while drain diffusion capacitance is more significant in the body-tied FinFET.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Gate misalignment / FinFETs / Simulation / Mixed-Mode / Series resistence / Diffusion capacitance / FO4 delay
Paper # ED2006-93,SDM2006-101
Date of Issue

Conference Information
Committee SDM
Conference Date 2006/6/26(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Investigation of Gate Misalignment Effects in FinFETs(Session 7A Silicon Devices IV,AWAD2006)
Sub Title (in English)
Keyword(1) Gate misalignment
Keyword(2) FinFETs
Keyword(3) Simulation
Keyword(4) Mixed-Mode
Keyword(5) Series resistence
Keyword(6) Diffusion capacitance
Keyword(7) FO4 delay
1st Author's Name Kuk-Hwan Kim
1st Author's Affiliation Dept. of EECS, Korea Advanced Institute of Science and Technology()
2nd Author's Name Jin-Woo Han
2nd Author's Affiliation Dept. of EECS, Korea Advanced Institute of Science and Technology
3rd Author's Name Yang-Kyu Choi
3rd Author's Affiliation Dept. of EECS, Korea Advanced Institute of Science and Technology
Date 2006/6/26
Paper # ED2006-93,SDM2006-101
Volume (vol) vol.106
Number (no) 138
Page pp.pp.-
#Pages 6
Date of Issue