| Presentation | 2006/6/26 The Dependence of Remaining Carbon in the Electrical Property of the Gate Insulator Film on SiC at Low Temperature Insulator Formation(Session 6B Power Devices,AWAD2006) Koutarou Tanaka, Hiroaki Tanaka, Akinobu Teramoto, Shigetoshi Sugawa, Tadahiro Ohmi, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | This paper investigated the influence on the electrical property of remaining carbon in the insulator film of MOS structure on 4H-SiC. The insulator films were formed by PECVD and radical oxynitridation using microwave-excited high-density plasma with NO gas. The oxide fixed charge and the interface trap density can be dramatically reduced by NO gas radical oxynitridation after oxide film formed by PECVD compared with by direct oxynitridation on 4H-SiC. It is confirmed that the electrical property is improved as the decrease of remaining carbon in the insulator film. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | SiC / Remaining carbon / Microwave-excited high-density plasma |
| Paper # | ED2006-88,SDM2006-96 |
| Date of Issue |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 2006/6/26(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
|---|---|
| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | The Dependence of Remaining Carbon in the Electrical Property of the Gate Insulator Film on SiC at Low Temperature Insulator Formation(Session 6B Power Devices,AWAD2006) |
| Sub Title (in English) | |
| Keyword(1) | SiC |
| Keyword(2) | Remaining carbon |
| Keyword(3) | Microwave-excited high-density plasma |
| 1st Author's Name | Koutarou Tanaka |
| 1st Author's Affiliation | Graduate School of Engineering, Tohoku University() |
| 2nd Author's Name | Hiroaki Tanaka |
| 2nd Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 3rd Author's Name | Akinobu Teramoto |
| 3rd Author's Affiliation | New Industry Creation Hatchery Center, Tohoku University |
| 4th Author's Name | Shigetoshi Sugawa |
| 4th Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 5th Author's Name | Tadahiro Ohmi |
| 5th Author's Affiliation | New Industry Creation Hatchery Center, Tohoku University |
| Date | 2006/6/26 |
| Paper # | ED2006-88,SDM2006-96 |
| Volume (vol) | vol.106 |
| Number (no) | 138 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |