Presentation 2006/6/26
Observation of gate-bias dependent interface coupling in thin SOI MOSFETs(Session 6A Silicon Devices III,AWAD2006)
Y. C. Jung, K. H. Cho, S. W. Hwang, D. Ahn,
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Abstract(in English) We have fabricated and characterized a silicon-on-insulator (SOI) metal-oxide-semiconductor field-effect-transistor (MOSFET) with the SOI film thickness of 26nm. The measured data show that the transconductance (g_m) peak in the front gate bias shifts and then splits into two peaks as the back gate voltage decreases. This observation is interpreted as due to a transition between the volume inversion state and the interface state. The ratio of the g_m peak splitting to the change of back gate bias is approximately the same as the capacitive coupling factor between the front and the back interfaces. Our observation is consistent with double layer conduction observed in an earlier SOI quantum dot transistor [1].
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Keyword(in English) thin SOI MOSFET / transconductance peak splitting / volume inversion
Paper # ED2006-81,SDM2006-89
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Committee SDM
Conference Date 2006/6/26(1days)
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Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Observation of gate-bias dependent interface coupling in thin SOI MOSFETs(Session 6A Silicon Devices III,AWAD2006)
Sub Title (in English)
Keyword(1) thin SOI MOSFET
Keyword(2) transconductance peak splitting
Keyword(3) volume inversion
1st Author's Name Y. C. Jung
1st Author's Affiliation Electronics and Computer Engineering, Korea University()
2nd Author's Name K. H. Cho
2nd Author's Affiliation Electronics and Computer Engineering, Korea University
3rd Author's Name S. W. Hwang
3rd Author's Affiliation Electronics and Computer Engineering, Korea University:Institute of Quantum Information Processing and Systems, University of Seoul
4th Author's Name D. Ahn
4th Author's Affiliation Institute of Quantum Information Processing and Systems, University of Seoul
Date 2006/6/26
Paper # ED2006-81,SDM2006-89
Volume (vol) vol.106
Number (no) 138
Page pp.pp.-
#Pages 4
Date of Issue