Presentation 2006/5/11
Orientation of Poly (di-hexyl silane) Thin Films(Evaluation of organic materials)
Shoji Furukawa, Hidetaka Ohta, Hitoshi Arakawa,
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Abstract(in English) Poly (di-hexyl silane) thin films are prepared by casting the solution onto (100) Si substrates, and the structure of the films obtained is examined by the X-ray diffraction method. As a result, it is found that the strength of the diffraction peaks from (010), (110), (020), and (220) planes is strong, whereas that of the diffraction peaks from (100) and (200) planes is weak. The reason is discussed on the bases of the molecular structure and packing of poly (di-hexyl silane).
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Paper # OME2006-30
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Committee OME
Conference Date 2006/5/11(1days)
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Registration To Organic Material Electronics (OME)
Language ENG
Title (in Japanese) (See Japanese page)
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Title (in English) Orientation of Poly (di-hexyl silane) Thin Films(Evaluation of organic materials)
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1st Author's Name Shoji Furukawa
1st Author's Affiliation Graduate School of Computer Science and Systems Engineering, Kyushu Institute of Technology()
2nd Author's Name Hidetaka Ohta
2nd Author's Affiliation Graduate School of Computer Science and Systems Engineering, Kyushu Institute of Technology
3rd Author's Name Hitoshi Arakawa
3rd Author's Affiliation Graduate School of Computer Science and Systems Engineering, Kyushu Institute of Technology
Date 2006/5/11
Paper # OME2006-30
Volume (vol) vol.106
Number (no) 37
Page pp.pp.-
#Pages 2
Date of Issue