Presentation | 2006/5/11 Orientation of Poly (di-hexyl silane) Thin Films(Evaluation of organic materials) Shoji Furukawa, Hidetaka Ohta, Hitoshi Arakawa, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Poly (di-hexyl silane) thin films are prepared by casting the solution onto (100) Si substrates, and the structure of the films obtained is examined by the X-ray diffraction method. As a result, it is found that the strength of the diffraction peaks from (010), (110), (020), and (220) planes is strong, whereas that of the diffraction peaks from (100) and (200) planes is weak. The reason is discussed on the bases of the molecular structure and packing of poly (di-hexyl silane). |
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Paper # | OME2006-30 |
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Committee | OME |
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Conference Date | 2006/5/11(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Organic Material Electronics (OME) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Orientation of Poly (di-hexyl silane) Thin Films(Evaluation of organic materials) |
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1st Author's Name | Shoji Furukawa |
1st Author's Affiliation | Graduate School of Computer Science and Systems Engineering, Kyushu Institute of Technology() |
2nd Author's Name | Hidetaka Ohta |
2nd Author's Affiliation | Graduate School of Computer Science and Systems Engineering, Kyushu Institute of Technology |
3rd Author's Name | Hitoshi Arakawa |
3rd Author's Affiliation | Graduate School of Computer Science and Systems Engineering, Kyushu Institute of Technology |
Date | 2006/5/11 |
Paper # | OME2006-30 |
Volume (vol) | vol.106 |
Number (no) | 37 |
Page | pp.pp.- |
#Pages | 2 |
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